Used LAM RESEARCH 2300 Versys Kiyo #9226894 for sale

LAM RESEARCH 2300 Versys Kiyo is an etcher / asher designed for semiconductor device fabrication. It is a fully enclosed, high-pressure, high-temperature, high vacuum etcher designed to process large-area substrates in the 300mm size range. The equipment has a large capacity and a patented atmospheric loadlock design which allows for easy and efficient substrate transfer. The system can process a range of materials including Si, SiGe, SOI, Al, Ti, Cu, and more. The unit is a high-efficiency, dual-wavelength, ion-machine etch platform that is capable of performing both standard and high aspect ratio processes. It is equipped with a high-power etching source, high-pressure gas injection, exhaust handling tool, and in-situ diagnostic asset. The etch chamber and process modules are constructed from robust stainless steel and feature precise temperature control over the entire etching process. It is capable of achieving high-temperature and high-plasma conditions for deep anisotropic etch processes with minimal chamber contamination. The model is also equipped with LAM RESEARCH patented Kiyo™ Sidestream Processing, which allows for improved etch uniformity and improved process stability. This feature enables independent control of the plasma on each side of the etching chamber, allowing the etch profile to be optimized to to the requirements of the process. The equipment also has a process monitoring system that allows for real-time monitoring of critical parameters such as wafer geometry, temperature, and plasma uniformity. The unit is fully integrated and automated with a Windows-based graphical user interface (GUI) and on-screen process control. The interface allows for easy setup of complex processes and provides a comprehensive report machine that includes a process catalog and real-time process data. The tool also features in-chamber optical measurements to collect data on film and oxide thickness as well as profile shape. 2300 Versys Kiyo is a reliable and versatile etcher/asher that can meet the demanding needs of semiconductor device fabrication. It is designed for high throughput, high-uniformity etching as well as chemical mechanical polishing (CMP). With its precise temperature control and advanced process monitoring capabilities, the asset is able to optimize performance while maintaining high yields.