Used LAM RESEARCH 2300 Versys Kiyo #9266036 for sale

LAM RESEARCH 2300 Versys Kiyo is an advanced etcher/asher designed for high-throughput and high-performance processing of low-temperature materials in semiconductor production. It is equipped with a dual-chamber design which can accommodate two separate substrates within a single chamber. The chamber is capable of reaching temperatures up to 500C and can be finely adjusted with the use of powerful controls to ensure proper material processing. 2300 Versys Kiyo provides precise gas distribution and control that is essential for advanced process control and repeatable results. It is incorporated with Lam's proprietary in-situ photoresist stripping mechanism with unique cathodic arc delivery that provides superior results with no measurable damage to the underlying substrate. Additionally, the Kiyo includes a high capacity gas delivery equipment for the etching and ashing of up to 8 wafers simultaneously for greater throughput. In addition, its sophisticated vacuum manifold design allows for precise and repeatable etch results. LAM RESEARCH 2300 Versys Kiyo has been designed with comprehensive process monitoring capabilities to ensure repeatable precise results. It is integrated with an intuitive software package, allowing for efficient fine-tuning of parameters via its graphical user interface. Additionally, the state-of-the-art digital closed-loop process control technology provides optimal wafer uniformity for post-process analysis. 2300 Versys Kiyo also features a patented pre-diffusion stage which allows for accurate diffusion of materials in the vertical direction prior to etching. It is also the only system that provides a single unit gas injection unit with patented enclosure technology that ensures accurate uniform deposition without exposing other structures to unwanted materials. Lastly, its front access maintenance door simplifies operation and facilitates fast and easy repairs of the machine. LAM RESEARCH 2300 Versys Kiyo is an advanced, high-performance etcher/asher designed for the production of low-temperature materials for semiconductor applications. Its dual-chamber design, precision gas delivery, highly accurate process control and in-situ photoresist stripping mechanism provide consistent, repeatable results with optimal wafer uniformity. These features, combined with its intuitive user interface and rapid maintenance capability, make 2300 Versys Kiyo an ideal choice for high-throughput applications.