Used LAM RESEARCH 2300 Versys Kiyo #9301851 for sale
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ID: 9301851
Wafer Size: 12"
Vintage: 2016
Etcher, 12"
Seismic brackets system
SEMI Wafer
Cassette type: 25-Slots
Gas system type: IGS Gas box
Mylar floor template
Manuals electronic CD-ROM
Positions:
Position 1: 2300 Microwave strip
Position 2 and 3: 2300 Versys Kiyo
Non-standard systems:
NSR300156 Kiyo
NSR301982 RMV Kiyo PM Position-4
Process modules:
(2) Quick clean kits for 2300 Versys Kiyo
(1) Quick clean kit for 2300 MW Strip
Options:
Standard chamber pinnacle (-814)
Tunable ESC Wafer clamping mechanism
Standard fingers RF Ground bracket (-006)
Quartz edge ring
Standard Quartz tunable injector
Standard injector shield
Standard plasma screen (-032)
Gas weldment: Enhanced passivated (-110)
Standard ESC Hose kit
Compression ESC Facility plate
Liner: ACME Coated universal (-838)
Standard chamber manometer
Wafer lift mechanism: Direct drive
Voltage control interface: 800 V
O-rings: Chemraz
Standard TCP Coil
TCP Source dual: 1500 W
300MM Turbo pump: 2200 L/S BOCE (Seiko Seiki)
Heated foreline
Endpoint detection: 2300 LSR with OES 2
Standard chamber viewport window
Chamber isolation valve: Barrier seal door
Viton vacuum valve
Lower isolation valve: Chemraz dry (-006)
Water control passive:
RF PCW Control
Pump to TCU: 25ft
TCU to PM: 50ft
PM to Pump interconnect: 50ft
TCU to RPDB: 25ft
Pump to RPDB: 25ft
Microwave strip options:
O-rings: Fluorosilicon / TEV
Microwave source: Quartz
Baffle: Quartz
Leak check port
Chamber isolation valve: Barrier seal door
Throttle valve (-003)
2-Line on-board gas delivery
PM to Pump interconnect: 50ft
Pump to RPDB: 25ft
Gas box:
Standard gas containment
Top exhaust gas system
Gas box:
Advanced chamber condition control
MFC Type: STEC SEC-Z313
No display in transducer
(16) Gas lines
Heated gas lines: Position 1 and 2
Gas box inlet option: Regulated inlet gas panel
Standard gas filter
Non-standard PM/GB Feature:
(2) FUJIKIN NSR 301983 MFC on PM4 IGSGB <PM4>
Line6 : FUJIKIN FCST1005NZFC_4J2, SO2 at 200sccm
Line16 : FUJIKIN FCST1005NZFC_4J2, Ar at 500sccm
2300 Platform
Standard front fascia
Front end load port cassette: (3) FOUPs
Cassette ID: Keyence BCR Carrier ID
Factory automation: OHT PIO Sensor
Airlock wafer fingers: Stainless wafer pads
EPX Backing pumps for TM
Control rack configuration:
Side monitor user interface
Earth Leakage Breaker (ELB)
RPDB
Interconnect cables: TM to RPDB, 50ft
Signal tower
System options:
System calibration and alignment
Service step for PM
Robot CDM
Non-Standard TM Feature:
NSR6975 Facility IF board kit and SW Key
NSR101080 Vespel endeffector on V2 TM
Gas box configuration:
PM2:
Line / MFC Type / Gas type / Gas Flow
Line 01 / SZ313 / SICL4 / 50
Line 03 / SZ313 / NF3 / 500
Line 04 / SZ313 / CL2 / 200
Line 05 / SZ313 / HBr / 500
Line 06 / SZ313 / SO2 / 200
Line 07 / SZ313 / CH2F2 / 200
Line 09 / SZ313 / O2 / 10
Line 10 / SZ313 / SF6 / 50
Line 11 / SZ313 / O2 / 500
Line 12 / SZ313 / N2 / 100
Line 13 / SZ313 / CF4 / 200
Line 14 / SZ313 / CHF3 / 300
Line 15 / SZ313 / He / 500
Line 16 / SZ313 / Ar / 500
PM3:
Line / MFC Type / Gas type / Gas Flow
Line 01 / SZ313 / SICL4 / 50
Line 03 / SZ313 / NF3 / 500
Line 04 / SZ313 / CL2 / 200
Line 05 / SZ313 / HBr / 500
Line 06 / SZ313 / SO2 / 200
Line 07 / SZ313 / CH2F2 / 200
Line 09 / SZ313 / O2 / 10
Line 10 / SZ313 / SF6 / 50
Line 11 / SZ313 / O2 / 500
Line 12 / SZ313 / N2 / 100
Line 13 / SZ313 / CF4 / 200
Line 14 / SZ313 / CHF3 / 300
Line 15 / SZ313 / He / 500
Line 16 / SZ313 / Ar / 500
PM4:
Line / MFC Type / Gas type / Gas flow
Line 01 / SZ313 / SICL4 / 50
Line 03 / SZ313 / NF3 / 500
Line 04 / SZ313 / CL2 / 200
Line 05 / SZ313 / HBr / 500
Line 06 / SZ313 / SO2 / 200
Line 07 / SZ313 / CH2F2 / 200
Line 09 / SZ313 / O2 / 10
Line 10 / SZ313 / SF6 / 50
Line 11 / SZ313 / O2 / 500
Line 12 / SZ313 / N2 / 100
Line 13 / SZ313 / CF4 / 200
Line 14 / SZ313 / CHF3 / 300
Line 15 / SZ313 / He / 500
Line 16 / SZ313 / Ar / 500
2016 vintage.
LAM RESEARCH 2300 Versys Kiyo is a versatile and efficient etching equipment designed specifically for applications such as silicon single-crystal thin-film deposition, advanced photolithography, and surface scratches repair. This system is a high-end etcher/asher equipped with advanced technologies such as plasma etching, Dry-Oxide deposition, etching, and resist deposition. 2300 Versys Kiyo features a 20kHz plasma input frequency, as well as a wide range of process gases for reliable etching processes. It is a fully automatic machine that takes care of the entire process, from loading the wafer to unloading the results. To ensure accurate and repeatable results, the etcher features an automatic wafer handling unit and a built-in vacuum chamber. LAM RESEARCH 2300 Versys Kiyo also features the latest in-situ imaging and advanced process control, allowing the user to monitor the process and make quick changes on the fly. To ensure consistent, high-precision results, the machine is equipped with a 6-axis tilt and 2-axis yaw positioner. It also offers an optional in-chamber ion source for etching using controlled atmospheric processes. With its advanced features and durable, reliable construction, 2300 Versys Kiyo is an excellent choice for a wide range of demanding etching and ashing applications. The tool is certified to strict safety standards and is equipped with a fail-safe asset that provides an additional layer of protection during the etching process. Additionally, with its high efficiency and fast turnaround, LAM RESEARCH 2300 Versys Kiyo is ideal for rapid prototyping and rapid development in product design.
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