Used LAM RESEARCH 2300 Versys Kiyo #9353167 for sale

LAM RESEARCH 2300 Versys Kiyo is one of the most advanced etchers and ashers available today. This tool is designed to provide precision etching and ashing in a wide variety of applications across semiconductor, MEMS, and LED production environments. This equipment is capable of processing both flat and contoured wafers, with unsurpassed precision, speed, and repeatability. This system is able to process wafers up to 200mm in diameter, and offers numerous different process parameters that are adjustable based on the operator's requirements. The Kiyo is available with both a low-flow and a high-flow version for added flexibility. The low-flow version has a flow rate of 2 - 5 liters per minute, while the high-flow version has a flow rate of 7 - 10 liters per minute. The Versys Kiyo's process chamber is designed with safety features and offers excellent plasma uniformity, allowing for tighter etching tolerances and better edge accuracy. With a maximum pressure of 200 Millibar (Mbar) and a temperature range of 15 - 40 C, the Versys Kiyo can handle a wide variety of etch and ash processes, and has options for both manual process control, as well as integrated process control capabilities. The unit is also equipped with numerous safety features, including an automatic gas shut-off, an emergency venting machine, and an emergency stop button located at the front of the machine. These features ensure operator safety at all times during etching and ashing processes. In addition, the Versys Kiyo comes with a Liquid crystal display (LCD) touchscreen that enables easy access to settings, can monitor the current process cycle, as well as retrieve and analyze data for process improvement. This tool is also equipped with a "Soft Vac" capability, which allows for more precise, efficient, and safety etching and ashing processes. Overall, 2300 Versys Kiyo is an ideal tool for precision etching and ashing in the most demanding semiconductor, MEMS, and LED production environments. The asset's combination of advanced plasma uniformity, numerous safety features, and reliable process control capabilities make this a superior etching and ashing solution.