Used LAM RESEARCH 2300 Versys Poly #9158592 for sale

Name: LAM RESEARCH 2300 Versys Poly
Brand: LAM RESEARCH
SKU: 9158592
Availability: InStock

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Photo Used LAM RESEARCH 2300 Versys Poly For Sale

Etchers / Ashers

Manufacturer

LAM RESEARCH

Model

2300 Versys Poly

ID: 9158592

Poly etcher EFEM: Part no Load port (1): 002-7200-33 Load port (2): 002-7200-33 Load port (3): 002-7200-29 Atm robot: Yes Wafer alignment: Yes Power control rack: AC Rack: Model no: 2300 Vintage: 2007 Rear user interface monitor: Yes Robot controller: No P/C: Yes Vacuum TM: Airlock (Right): Yes Airlock (Left): Yes VTM Robot: No TM / PM Facility lines: Yes Slop valve load lock (Right): Yes Slop valve load lock (Left): Yes Vacuum TM: Part no Inner door Assy (Air lock right): 853-007851-232 Inner door Assy (Air lock left): 853-007851-232 Inner door Assy (PM2): 853-007859-925 Inner door Assy (PM3): 853-007859-212 Inner door Assy (PM4): 853-007859-223 Process module: PM1: 2300 Poly: Model no: 2300 poly TCP match: Yes TCP coil: Yes Bias match: Yes Process manometer: Model no: E28B-30584 Range: 0.1 Torr Process manometer valve assy: No AC/SSR Box: Yes Fore line manometer: Yes Turbo pump fore line isolation valves, manometers: Yes Turbo pump: Yes (ATM2800M) VME Assembly: Yes VAT Pendulum valve: Yes Foreline assy: No He cooling / lift box: Yes RF Cart: PM2 Turbo controller: Yes Generator (TCP): Yes Generator (BIAS): Yes PM1: Gas box (GIB): Yes MFC 1_CL2: Yes MFC 2_HBR: Yes MFC 3_SF6: Yes MFC 4_AR: Yes MFC 5_CH3F: Yes MFC 6_CF4: Yes MFC 7_SF6: Yes MFC 8_02: Yes MFC 9_NF3: Yes MFC 10_O2: Yes MFC 11_HE: Yes MFC 12_CHF3: Yes RPDB Power box: Yes Process module: PM2: 2300 Poly: Model no: 2300 poly Vintage: 2007 TCP match: Yes TCP Coil: Yes Bias match: Yes Process manometer: Model no: E28B-23747 Range: 0.1 Torr Process manometer valve assy: Yes AC/SSR Box: Yes Fore line manometer: Yes Turbo pump fore line isolation valves, manometers: No Turbo pump: Yes (ATM2300M) VME Assembly: Yes VAT pendulum valve: Yes Foreline assy: Yes He cooling / lift box: Yes RF Cart: PM3 Turbo Controller: Yes Generator (TCP): Yes Generator (BIAS): Yes PM2: Gas box (GIB): Yes MFC 1_CL2: Yes MFC 2_HBR: Yes MFC 3_SF6: Yes MFC 4_AR: Yes MFC 5_CH3F: Yes MFC 6_CF4: Yes MFC 7_SF6: Yes MFC 8_02: Yes MFC 9_NF3: Yes MFC 10_O2: Yes Process module: PM3: 2300 Poly: Model no: 2300 poly Vintage: 2007 TCP match: Yes TCP Coil: Yes Bias match: Yes Process manometer: Model no: E28B-23747 Range: 0.1 Torr Process manometer valve assy: No AC/SSR Box: Yes Fore line manometer: Yes Turbo pump fore line isolation valves, manometers: Yes Turbo pump: Yes (ATM2800M) VME Assembly: Yes VAT Pendulum valve: Yes Foreline assy: No He cooling / lift box: Yes RF Cart: PM4 Turbo controller: Yes Generator (TCP): Yes Generator (BIAS): Yes PM3: Gas box (GIB): Yes MFC 1_CL2: Yes MFC 2_HBR: Yes MFC 3_SF6: Yes MFC 4_AR: Yes MFC 5_CH3F: Yes MFC 6_CF4: Yes MFC 7_SF6: Yes MFC 8_02: Yes MFC 9_NF3: Yes MFC 10_O2: Yes MFC 11_HE: Yes MFC 12_CHF3: Yes Vintage: 2007.

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LAM RESEARCH 2300 Versys Poly is an advanced etching (also known as ashing) equipment designed for superior throughput, efficiency, and accuracy. This equipment is a fully automated system for the etching of silicon wafers with the use of plasma technology. 2300 Versys Poly offers a number of features to help provide quality and reliability on every etching job. LAM RESEARCH 2300 Versys Poly comes equipped with a 4-inch process chamber and a 2-inch deep etch feature, allowing for wafer etching to a maximum level of 7 um. It was built with the highest standards in mind and captures data points for every etch recipe to ensure quality control and process repeatability. The unit also features a maximum plasma fuel mix capability of 0.6 sccm/min, which can be optimized for each etching job for maximum efficiency and throughput, as well as the ability to input a variety of process recipes. The recipes can be stored, traced, and accessed through a built-in recipe manager. The machine is designed for a wide variety of etching applications, such as oxide etching and wafer patterning. It features an open field ion source design, allowing the user to monitor ion mill current over a range of energies. It also has the ability to maintain optimum wafer temperature control throughout the process, ensuring consistent etching performance. 2300 Versys Poly also features a highly sensitive end-point detection tool, which utilizes laser light scattering to provide a precise etch stop measurement. This feature is beneficial for critical etching applications where accuracy is key. LAM RESEARCH 2300 Versys Poly is designed to be user friendly and simple to operate, with digital imaging capabilities and an intuitive control interface. The asset is also highly reliable and built with the latest industrial grade components, providing dependability and reduced operating costs. 2300 Versys Poly is an advanced etching model that combines a variety of features to provide superior throughput, efficiency, and accuracy for a wide variety of etching applications. The equipment is designed to fulfill the most demanding etching needs, providing reliable and consistent results for plenty of industrial applications.