Used LAM RESEARCH 2300 Versys #9007779 for sale

LAM RESEARCH series LAM RESEARCH 2300 Versys is a sophisticated etching/asching equipment designed to serve the needs of the semiconductor industry. With a wide array of process modules, this system is capable of performing critical etching and asching tasks in the production of modern semiconductor devices. 2300 Versys is equipped with a highly reliable and robust process chamber and intelligent controls. This process chamber is sealed and has no exposure to external atmosphere to ensure a clean and pure environment for etching and asching materials. Additionally, the chamber incorporates a nitrogen-based plumbing unit that enables the subsonic distribution of the process gases throughout the chamber providing uniform deposition of materials. LAM RESEARCH 2300 Versys' advanced remote plasma source and reactive ion etching capability enables high-precision control over etching speed, patterning, etching size and uniformity, and resist loading and removal. Furthermore, multi-chamber evacuation and backfill capabilities allow for complete containment of etching by-products, thereby reducing contamination. Furthermore, the machine's automated process control capabilities allow for quick set-up and changeover without manual tuning. Moreover, with comprehensive process monitoring and diagnostics capability, process yield and quality can be optimized along with improved reliability and availability. In addition, the advanced process control computer (APCC) of 2300 Versys allows complete tracking and logging of the process recipe parameters and results, along with providing real-time data acquisition and manipulation capabilities. The APCC also has an integrated power supplies and the mainframe has a wide variety of modules to accommodate interfacing with a multitude of process tools. In conclusion, LAM RESEARCH 2300 Versys is a highly advanced etching/asching tool with sophisticated process control and monitoring capabilities. With its highly reliable and robust process chamber and intelligent controls, this asset provides for efficient and reliable etching and asching. Additionally, this versatile platform powers many production tools, making it perfect for modern semiconductor production needs.