Used LAM RESEARCH 2300 Versys #9008862 for sale
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ID: 9008862
Metal etcher, 12"
Install Type: Stand-Alone
Application: M1/M2 Al Etch
System Software (ver.): 1.7.2sp2HF4-CST-5
Chambers: (2) Metal Etch CH + (2) Ash/Strip CH
Factory Interface/Automation:
Interface: (3) Carrier Stage (continuous flow operation)
Brooks 300mm Load-Ports
25-Slot FOUPs (complies w/SEMI E47.1)
Overhead Transport System (OHT)
OHT PIO Sensors
Wafer ID Reader: No WIDS, Bottom Read
Carrier ID Reader: HERMOS RF Tag-Reader
Main-Frame (M/F) / Transport Module (TM):
Platform Type: Version 2
User Interface-1: Front side, Flat Panel Display
User Interface-2: System side, Flat Panel Display
GEM/CIM JGJ: Ethernet 100BaseT
Status Lamp: (2) R/Y/G/B
1: Front side (FI), Upper-Left
2: Tool side, Upper-Right
EMOs: (2) Front, (2) Rear
Conditioning Stage: 4-Slot Cooling Station
Heated Fore-lines
Dual Drop Sub-Panel
UPS on System
GFI Main CB
TM Gas Box: 12-Line Enhanced Gas Box
Tool Fab Interlocks:
Gas Box Door (Local) Fab
Fab Gas Box Iso-Valves
Utility Box:
Regulators:
CDA: SMC AR2500
N2: Veriflo SQ-420E
He: Veriflo SQ-Micro
Manual Valve: OGD20V-6RM-K / OGD10V-4RM-K (CKD)
Pressure Gauge: Bourdon Gauge
De-installed by OEM
2006 vintage.
LAM RESEARCH VErsys 2300 etcher / asher is a high-end etcher and asher equipment that is ideal for etching and cleaning process applications in the semiconductor industry. The Versys 2300 features an advanced power-decoupled process chamber that provides a wide range of pressure, temperature, and gas flows to meet all etching and cleaning needs. The Versys 2300 also has an integrated load lock chamber and a remote plasma source, allowing for quick and efficient loading and unloading of wafers, as well as the use of both low-temperature and high-temperature processes. The Versys 2300 features LAM's patented thermal modulation design that provides optimal control for temperature uniformity and repeatability. This feature makes it one of the most reliable etching / ashing systems in the industry, as it provides improved accuracy in process control and ensures consistent, repeatable results. The Versys 2300 also sites two types of plasma sources: a remote plasma source (RPS) and a plasma torch system (PTS). The remote plasma source uses a quartz window to contain the plasma and is capable of higher power levels, while the plasma torch unit it more reliable and produces more consistent results at low power levels. The Versys 2300 also features an advanced process automation machine called SES (Smart Etcher Tool). This asset allows for full automation of the etching and cleaning process with minimal operator input, which significantly reduces the risk of human error. Additionally, the model can be configured with a variety of software options and customized recipes to accommodate multiple process requirements. The Versys 2300 also comes with LAM's innovative AI diagnostic tools, giving users access to real-time monitoring of their equipment and process information. This allows users to quickly and easily identify process issues and make corrections when needed. The Versys 2300 is a reliable and efficient equipment that is perfect for any etching and cleaning application in the semiconductor industry.
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