Used LAM RESEARCH 2300 Versys #9044491 for sale

LAM RESEARCH 2300 Versys is an etcher/asher designed to provide high productivity and advanced process flexibility for etching and ashing applications. 2300 Versys is built on a Dual Pocket Load Lock platform with a HotWafer capability for reduced throughput delays, which allows for higher throughputs at any given recipe. The system comes with multiple etch, clean, and ash technologies for different applications, including Reactive Ion Etching (RIE), Plasma Immersion Ion Deposition (PIID), Electron Cyclotron Resonance (ECR), and Kinetic Inductance Deposition (KID). Its modular design incorporates all the necessary elements of the etching machinery - source, chamber, controller, and power supplies - into a single chassis, making it easy to install and maintain. LAM RESEARCH 2300 Versys also offers increased process flexibility, lower cost of ownership, and reduced materials costs compared to traditional etching systems. 2300 Versys is configurable for both production and research applications, enabling custom configurations for optimal productivity, uptime, and repeatability. Its reliable, high-performance RF and microwave generators are sized specifically to offer limited lifetime maintenance. An adjustable source/chamber isolation system supports low-current plasma generation, while the flexible automated tuning controls enable quick and accurate process setup. Additionally, LAM RESEARCH 2300 Versys features an integrated mass flow controller and gas panel, which allows for real-time control and monitoring of process gases, and a fast-acting reaction chamber door and dust filter provide superior dust protection and fast wafer loading/unloading. Overall, 2300 Versys offers a high level of performance and flexibility for etching and ashing applications. Its advanced technologies and integrated systems ensure high reliability and throughput for production and research environments alike.