Used LAM RESEARCH 2300 Versys #9161243 for sale

Name: LAM RESEARCH 2300 Versys
Brand: LAM RESEARCH
SKU: 9161243
Availability: InStock

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Etchers / Ashers

Manufacturer

LAM RESEARCH

Model

2300 Versys

ID: 9161243

Wafer Size: 12"

Metal etcher, 12" EFEM: Part no Load port (1): 002-7200-21 Load port (2): 002-7200-32 Atm robot: No Wafer alignment: 03121001 Power control rack: AC Rack: Model no: 2300 Vintage: 2003 Rear user interface monitor: Yes Robot controller: No P/C: Yes Vacuum TM: Airlock (Right): Yes Airlock (Left): Yes VTM Robot: No TM / PM Facility lines: Yes Slop valve load lock (Right): Yes Slop valve load lock (Left): Yes Vacuum TM: Part No Inner door Assy (Air lock Right): 853-007861-231 Inner door Assy (Air lock Left): 853-007861-003 Inner door Assy (PM2): 853-007859-002 Inner door Assy (PM3): 853-007859-212 Inner door Assy (PM4): 853-007859-212 Process module: PM2: 2300 Poly: Model no: Metal 2300 Vintage: 2003 TCP Match: Yes TCP Coil: Yes Bias match: Yes Process manometer: Model no: E28B-23747 Range: 0.1 Torr Process manometer valve assy: Yes AC/SSR Box: Yes Fore line manometer: Yes Turbo pump fore line isolation valves, manometers: Yes Turbo pump: Yes (ATM2300M) VME Assembly: Yes VAT Pendulum valve: Yes Fore line Assy: Yes He cooling / Lift box: Yes Motor stepper board: Yes RF Cart: PM2 Turbo controller: Yes Generator (TCP): Yes (660-900984-008) Generator (BIAS): Yes (3155059-026) PM1: Gas box (GIB): Yes MFC 1_CL2: Yes MFC 2_HBR: Yes MFC 3_SF6: Yes MFC 4_AR: Yes MFC 5_N2: Yes MFC 6_CF4: Yes MFC 7_O2: Yes MFC 8_SF6: Yes MFC 9_HE: Yes MFC 10_O2: Yes MFC 11_NF3: Yes MFC 12_30%O2/HE: Yes Regulator (12/12): 12/12 RPDB Power box: Yes PM3: TCP Match: Yes TCP Coil: Yes Bias match: Yes Process manometer: Model no: E28B-23743 Range: 0.1 Torr Process manometer valve assy: Yes AC / SSR Box: Yes Fore line manometer: Yes Turbo pump fore line isolation valves, manometers: Yes Turbo pump: Yes (ATM2300M) VME Assembly: Yes VAT Pendulum valve: Yes Fore line Assy: Yes He cooling / Lift box: Yes Motor stepper board: Yes RF Cart: PM2 Turbo controller: Yes Generator (TCP): Yes (660-900984-008) Generator (BIAS): Yes (3155059-026) PM2: Gas box (GIB): Yes MFC 1_CL2: Yes MFC 2_HBR: Yes MFC 3_SF6: Yes MFC 4_AR: Yes MFC 5_N2: Yes MFC 6_CF4: Yes MFC 7_O2: No MFC 8_SF6: Yes MFC 9_HE: Yes MFC 10_O2: Yes MFC 11_NF3: Yes MFC 12_30%O2/HE: Yes Regulator(12/12): 10/12 PM4: TCP Match: Yes TCP Coil: Yes Bias match: Yes Process manometer: Model no: E28B-23743 Range: 0.1 Torr Process manometer valve assy: No AC / SSR Box: Yes Fore line manometer: Yes Turbo pump fore line isolation valves, manometers: Yes Turbo pump: Yes (ATM2300M) VME Assembly: Yes VAT Pendulum valve: Yes Foreline Assy: No He cooling / Lift box: Yes Motor stepper board: Yes RF Cart: PM2 Turbo controller: Yes Generator (TCP): Yes (660-900984-008) Generator (BIAS): Yes (3155059-026) PM3: Gas box (GIB): Yes MFC 1_CL2: Yes MFC 2_HBR: Yes MFC 3_SF6: Yes MFC 4_AR: Yes MFC 5_N2: Yes MFC 6_CF4: Yes MFC 7_O2: Yes MFC 8_SF6: Yes MFC 9_HE: Yes MFC 10_O2: Yes MFC 11_NF3: Yes MFC 12_30%O2/HE: Yes Regulator(12/12): 12/12.

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LAM RESEARCH 2300 Versys is a fully automated etcher/asher platform, developed by the leading supplier of semiconductor manufacturing technologies, LAM RESEARCH. It is designed to meet the specific needs of device producers, including those in the advanced CMOS, MEMS and power industries. The Versys utilizes plasma etch and ash techniques to accurately create high-precision features to tight tolerances. The etch component features an optimized LAMSource microwave generator, a precision etch chamber, and proprietary gas delivery equipment. The ashing component uses the ChamberPlus ashing process, a high-reactivity, low-leakage, low-temperature ashing system. The Versys is designed with a tight process window, allowing it to etch, ash, and define features with micron levels of accuracy. Its high reliability and repeatability further ensure precision, even on complicated and most challenging profiles. The etch and ash processes are dose-monitored and edge-managed, allowing complete control over etch and ash profiles in both pre-defined and custom topographies. The wafer handling unit is fully automated and solution based, which simplifies the delivery of on-time processing and job doubling in a single machine. The Versys is user friendly, with a large and easy to read touchscreen interface, a comprehensive etch and ash library, and powerful data collection capabilities. It also offers real-time performance monitoring and control with review of status, alarms and traces. The Versys is a complete etch/ash solution, designed to drive product performance and productivity. With high process yields and maximum uptime, the Versys is a dependable tool intended to quickly provide product improvements in a reliable, cost-effective manner.