Used LAM RESEARCH 2300 Versys #9251179 for sale

ID: 9251179
Etcher, 8" 2007 vintage.
LAM RESEARCH 2300 Versys is a high-performance etching equipment specifically designed to etch silicon, metals, and other materials. It is a fully automated tool featuring a microprocessor-controlled auto-focus system, integrated vacuum unit, and automated gas/vacuum interface. This etcher produces excellent results with the highest precision and accuracy, making it perfect for a variety of applications in the semiconductor industry. 2300 Versys features a robust and ergonomic design that provides a solid platform on which to execute multiple process steps consecutively. The Versys utilizes a high-power electron beam generator to scribe and etch patterned shapes out of the material being processed. This etcher is also capable of creating highly organized patterns with a high degree of accuracy and detail. The Versys is also equipped with a powerful post-processing workbench which allows for quicker and more efficient material processing. This workbench provides easy access to valves and other components for quick adjustment and machine optimization. Additionally, the workbench contains several built-in safety features to protect both the user and the etching process from possible harm. LAM RESEARCH 2300 Versys also utilizes advanced susceptor technologies in order to optimize etch processes and ensure consistency throughout the procedures. This susceptor technology uses electrostatic fields to precisely control the direction and placement of the electron beam, enabling complex structures to be etched with unparalleled accuracy. 2300 Versys is an advanced etching tool that provides superior performance and exceptional results for a variety of different applications. Its integrated vacuum and susceptor technology ensures accuracy and accuracy, while its post-processing workbench makes it easy to customize or modify procedures quickly and efficiently. LAM RESEARCH 2300 Versys is the perfect etcher for any application where precision and reliability are essential.
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