Used LAM RESEARCH 2300 Versys #9251504 for sale

LAM RESEARCH 2300 Versys is an high-end etch and ash processing equipment designed to meet the rigorous requirements of today's complex IC manufacturing processes. 2300 Versys features a new, leading-edge processor to enable higher throughput, process flexibility and improved performance. LAM RESEARCH 2300 Versys includes a double-sided susceptor assembly with an upgraded high vacuum turbo molecular pump which provides rapid pumpdown time and uniform expansion of process gases over large substrates. It is able to process large substrates with a maximum wafer size of 300mm, making it an ideal tool for high volume production. 2300 Versys offers advanced process control capabilities, with its state-of-the-art automation system that allows for easy user programming, recipe formation and parameter setting. The unit includes a wide range of process capabilities, including etching, RIE (Reactive Ion Etching), IBE (Ion Beam Etching), wet etch, and ash. The ash capability is based on the patented multi-zone thermal oxide (MTO2) technology which enables highly uniform and repeatable oxide growth over large substrates. In addition to its automated control machine, LAM RESEARCH 2300 Versys also offers advanced in-situ monitoring options, including multi-gas detectors, optical emission spectroscopy and hemispherical reflectometry. Its in-situ monitoring capabilities allow for the accurate measurement of the process parameters and for ensuring production quality. 2300 Versys also features a number of process enhancements, such as a patented gap-filling process and improved deep etch profiles. It is designed to meet the tightest of dimensional requirements and is compatible with a wide range of film electrically resistant and conductor materials. The tool is configured with an integrated PECVD (Plasma Enhanced Chemical Vapor Deposition) process which can enable enhanced line-width control. To enable increased production yield and improved throughput, LAM RESEARCH 2300 Versys is available with a cluster tool configuration, combining the etch and ash asset with other modules like CPVD (Chemical Plasma Vapor Deposition), ALD (Atomic Layer Deposition), chemical etch and conformal coating. The model is available with several additional production options, like automated loadlock and automated cassette handlers as well as optional process samples monitoring and full-wafer reflectance monitoring. In summary, 2300 Versys is a high-performance etch and ash equipment, designed to meet the high production and process requirements of today's complex IC manufacturing. It offers advanced process control capabilities, increased throughput and uniform stoichiometry across large substrates, as well as a wide range of production options and in-situ monitoring options to ensure process and production quality.