Used LAM RESEARCH 2300 #293657750 for sale

LAM RESEARCH 2300 is an etcher/asher specifically designed for semiconductor and other microelectronic applications. 2300 utilizes advanced plasma etching technology to create an environment for precise etching of the most intricate device structures. It works by generating a plasma discharge to create a high-temperature condition within the chamber, allowing for a clean and precise etching process. The user then sets a set of etching parameters such as time, power, gas composition, and pressure. LAM RESEARCH 2300 then configures itself for optimal processing of the specific structure and material being etched. 2300 uses a Pulsed RF plasma discharge between a two-stage capacitively coupled-plasma source and an One-Step™ substrate chuck table. This technology allows for excellent process control throughout the etching process. LAM RESEARCH 2300 is fitted with LAM's Smart Processing Controllers, which allows users to control and monitor etching process from the system's computer interface. This controller can troubleshoot any etching issue automatically and provide instant feedback to the user. 2300 is also capable of generating a uniform plasma density throughout the etcher, utilize a wide range of gases for optimum process control, and deliver a high-level of uniformity in both physical characteristics and etch profiles for multiple process steps. It also includes features such as beam profiling and lateral control for product quality maintenance. LAM RESEARCH 2300 is optimized for quick delivery of wafers and effective operation with minimal maintenance. It features the industry leading Precision Modular® track design, enabling users to reduce the time for substrate transfers and etching results in higher device yields and cleaner processing. Overall, 2300 is an all-in-one etch and asher, featuring advanced etching and ashing technologies designed to deliver a precise and uniform etching process for a variety of semiconductor and other microelectronic applications. It is designed to deliver high-precision etch results with minimum maintenance, while maintaining optimal substrate throughput times.