Used LAM RESEARCH 2300e4 Kiyo EX #293619084 for sale
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ID: 293619084
Wafer Size: 12"
Vintage: 2012
Poly etcher, 12"
(3) Load ports
SEMI Wafer
Cassette type: 25-Slots
Gas box type: Jetstream
2300 Platform
Chamber type: Versys Kiyo E Series
2300 Versys Kiyo E Series
PTK Chamber
Temperature controlled window
HP Crystal window
Coated ceramic injector
Standard bayonet style injector shield
Gas weldment with coated
Standard injector shield
Enhanced plasma screen
SRC Enhanced grounded liner
Top and side gas feed
TCP Source: Plasma 2000 W
Enhanced TCP Coil support:
Bias match: 1.5 kW HVBP
Electrostatic chuck: EPX ERMZ
ESC Facility plate: Pl with routing
ESC Hose kit: Low temperature
Wafer lift mechanism: Prime movers
Voltage control interface: 1200 V
High bias kit
Single piece QUARTZ edge ring
Turbo pump, 12"
OES2 Endpoint detection
Standard chamber viewport window
Heated foreline clamp cover
Chamber isolation valve: Barrier seal door
Vacuum valve: Viton
Lower isolation valve: Valqua
Chamber manometer
UPC Enhanced
Water control: Passive RF PCW control
PCW Hoses: Chemical resistant
Exhaust duct: Reduced profile
Standard service cover
Pump to TCU, 50 ft
TCU to PM, 100 ft
Interconnect: Pump to PM, 100 ft
TCU to RPDB, 25 ft
Pump to RPDB, 25 ft
Regulated inlet gas panel
Gas system:
Jetstream
Mounting location: Transport module
Window door
Lock-out tag-out manual valve
FIB Facilitization
Facility box:
Top gas connection
Enhanced containment
Regulated with filter regulation
Nickel filter
SST Filter
Future PM: 4 Positions
Jetstream gases of 2302 Kiyo E Series:
Tuning gas
Heated lines position 1 and 2
Gas no / Gas / MFC Size / MFC Model
1 / SiCL4 / 100 SCCM / STEC Z719
2 / CL2 / 500 SCCM / STEC D219
3 / HBr / 500 SCCM / STEC D219
4 / CF4 / 400 SCCM / STEC D219
5 / BCl3 / 200 SCCM / MFC Z719
6 / He / 500 SCCM / STEC D219
7 / CH2F2 / 200 SCCM / STEC D219
8 / Ar / 1000 SCCM / STEC D219
9 / 30%HE/O2 / 50 SCCM / STEC D219
10 / NF3 / 1000 SCCM / STEC D219
11 / N2 / 250 SCCM / STEC D219
12 / SO2 / 200 SCCM / MFC D219
13 / SF6 / 200 SCCM / STEC D219
14 / CHF3 / 200 SCCM / MFC D219
15 / O2 / 500 SCCM / STEC D219
17 / C4F6 / 200 SCCM / MFC D219
ATM:
Front end load port: 3 FOUP BROOKS
Cassette ID: Hermos carrier ID
Factory automation: OHT PIO Sensor
Input buffer station: 25-Slot
CTC Computer storage: Hard Disk Drive (HDD) mirrored
VTM Load lock A and B: Standard
RPDB Subpanel
R-O-G-B Signal tower
Pre-facilities:
PM Peripherals backing pumps: ESR100WN
RPDB Backing pump CB Size: 30 A
TCU CB Size: 30A
TCU YR-8020
2300 Versys Kiyo E Series process module (PM1, PM2, PM3 and PM4): SiCl4, Cl2, HBr, CF4, He, Ar, CH2F2, 30%He/O2, NF3, N2, SO2, SF6, CHF3, O2
Does not include:
Dry pumps
Hard Disk Drive (HDD)
Power supply: 208 AC, 3 Phase
2012 vintage.
LAM RESEARCH 2300e4 Kiyo EX is a high-performance etcher / asher designed for semiconductor device manufacturing. It is a robust tool capable of etching and ashing a variety of materials, including silicon, silicon dioxide, aluminum and tungsten, at temperatures up to 1000 degrees Celsius. 2300e4 Kiyo EX operates in two primary configurations: RF impedance matching and pre-configured etch / ash. In RF impedance matching mode, it can process six substrate types and offers high-yield, low-cost processing. It comes equipped with a radio frequency generator that produces highly accurate and repeatable results. It also features an integrated pressure device that maintains process gases at the optimal pressure conditions. In pre-configured etch / ash mode, LAM RESEARCH 2300e4 Kiyo EX features several advanced features, such as advanced ion beam optics, multi-chamber plasma control systems and a silicon carbide chamber gate. The advanced ion beam optics improve process control and profile accuracy, while the multi-chamber plasma control systems provide flexibility for etch and ash recipes. Additionally, the silicon carbide chamber gate enables the user to manage plasma reactions and reduce debris. In addition to etch / ash capabilities, 2300e4 Kiyo EX also offers a high-accuracy profile measurement equipment. This system allows users to monitor the etch / ash profile with high resolution so they can ensure a consistently high-quality process. To further enhance its etch / ash capabilities, LAM RESEARCH 2300e4 Kiyo EX contains a temperature controller that allows for precise temperature control for both deposition and etching. It also features digital data recording and storage capabilities, a programmable controller for recipe optimization, and an auto-diagnostic test stand for unit maintenance. 2300e4 Kiyo EX is a reliable and efficient etcher / asher designed for the production of high-quality semiconductor devices. It offers advanced ion beam optics and temperature control capabilities, a high-accuracy profile measurement machine, digital data recording and storage capabilities, a programmable controller for recipe optimization, and an auto-diagnostic test stand for tool maintenance. With its robust features and ease of use, LAM RESEARCH 2300e4 Kiyo EX is a great choice for any semiconductor device manufacturing facility.
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