Used LAM RESEARCH 300NX #9257375 for sale

LAM RESEARCH 300NX is an etcher and asher for a variety of semiconductor manufacturing processes. 300NX is compatible with an array of liquid, slurry, and gas chemistries and is capable of plasma etching and plasma ashing, making it the perfect tool for small-scale to medium-scale production. It is designed to handle complex wafer geometries and has a process chamber dimension of 18"x18"x24" with a treatment area of 16". LAM RESEARCH 300NX boasts a unique showerhead design that utilizes a rotating baffle plate to effectively manage the cascading of chemistries for uniformity across all wafer surfaces. Additionally, it has a vertically-adjustable sub-ambient cooling ring to reduce wafer temperature, which improves the process repeatability. The equipment can be fully automated and remotely controlled, and all recipes and parameters can be stored for easy recall and retrieval. 300NX is also equipped with a state-of-the-art observation system and a user-friendly graphical user interface to constantly monitor, optimize, and perform maintenance on the etcher. For maximum productivity, LAM RESEARCH 300NX features a CenterTrack Wafer Handing Unit which is designed to increase wafer throughput and reduce cycle times. It also has a 3-stage process partition machine which allows up to three device processes to be performed with the same wafer. In addition, the autocontroller offers a host of process control tools, such as sub-process controllers and cycle controllers, that can be used to fine-tune process optimization. 300NX has a footprint of 61"x198"x103" and features an environmental control tool which ensures a stable atmosphere within the process chamber. It is equipped with a load lock to prevent contamination and is RoHS compliant. All in all, LAM RESEARCH 300NX is a highly advanced etcher and asher for complex semiconductor manufacturing processes.