Used LAM RESEARCH 300NX #9375202 for sale

LAM RESEARCH 300NX
Manufacturer
LAM RESEARCH
Model
300NX
ID: 9375202
Etcher.
LAM RESEARCH 300NX is an Etcher/Asher equipment designed for thin-film deposition processes in the semiconductor industry. This system is a multi-chamber vacuum deposition unit capable of operating in batch, single-wafer, and sequential production methods. The machine is composed of three main chambers, each with its own process gas control and the ability to evacuate to base pressures of 10-7 mBar. The first chamber is the loading chamber, with a load clamp designed to secure the wafer and a platform capable of supporting up to five wafers. Once the wafer is loaded, the chamber is evacuated through the turbo pump to achieve the desired pressure. The second chamber is the main process chamber, which contains the electrostat ion source that controls the reactive ion etching process. This is a DC bias source, direct current, that acts to supply ion energy to the etching process. Additionally, the process chamber contains a plasma generator with an integrated heater to control temperature profile during etching. The third chamber is the venting chamber, where the pressure is released to atmosphere. 300NX provides several features to increase throughput, improve process control and uniformity, and increase process repeatability. It is equipped with a precision elliptical chuck to ensure proper alignment between the wafer and the ion source, as well as an auto-pilot feature that maximizes etch uniformity and repeatability. The tool also provides both 3D end-point detection and substrate temperature mapping, so that users may monitor process end-points and detect variations in temperature. LAM RESEARCH 300NX is constructed from stainless steel and designed to meet Class 1 Clean Room standards, providing a dust-free environment for routine etch processing. A central control panel provides an intuitive work environment, enabling users with different levels of experience to operate the asset. Its stability and repairability make it a highly reliable model for all semiconductor etching applications.
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