Used LAM RESEARCH 384T #9383400 for sale

LAM RESEARCH 384T is an etcher (also referred to as an asher) that is mainly suitable for cleaning, developing, and etching substrates used in the semiconductor industry. The equipment features a stainless steel process chamber with a main RF pedestal, which generates the plasma via its ability to create the necessary temperature and power levels. The process chamber is enclosed within a vacuum envelope, which can be maintained at up to a 10-7 torr vacuum level. An effort has been made to design a system that is as compact as possible, with supporting components, such as the secondary chamber, located outside of the main processing chamber. The unit also features a multi-gate bias power supply module that provides the necessary power requirements for the etching process, up to 2000 watts of RF power. This power is adjustable in steps of 0.2 kW, and the machine can also be programmed to provide multiple output powers simultaneously. The process chamber utilizes a top-down approach, allowing for faster processing and easier removal of gaseous byproducts. In addition, the tool also systems include a partitioned slit plate, which can be adjusted to permit the selection of various gas flows, providing further flexibility for the etching process. The process chamber utilizes a one combination gas source that can provide a number of different source gases for the process to a secondary vacuum chamber. This allows for faster processing times, as well as more efficient utilization of the etching process. The asset also includes an advanced throttle regulating model, allowing users to precisely regulate the distribution of process gases in the chamber. The equipment is designed with backside cooling jets, which efficiently remove process heat, allowing for higher power levels and lower temperature operation. Finally, the system features a remote diagnostics option, with a Modbus RTU communication interface that makes it easy to monitor and control the unit remotely. Overall, 384T is an advanced etcher/asher that is designed to provide users with an efficient, accurate and cost-effective solution for semiconductor substrate processing. The machine's design supports high temperatures, up to 2000 watts of RF power and numerous gas sources, and its advanced control features offer easy monitoring and operation.