Used LAM RESEARCH 4400 #9292700 for sale

LAM RESEARCH 4400
Manufacturer
LAM RESEARCH
Model
4400
ID: 9292700
Wafer Size: 6"
Poly etchers, 6".
LAM RESEARCH 4400 is an advanced production etcher/asher designed to meet the needs of the most demanding microelectronic device fabrication applications. It features dual-beam Plasma Enhanced CVD (PECVD) technology, coupled with the proprietary gas delivery equipment. This surface conditioner provides a homogeneous and repeatable etching or removal process of hard dielectrics or micro cavities, as well as provides high accuracy plasma ashing of resist. 4400 features a modular design that allows for maximum flexibility and scalability. Its intelligent pattern recognition system ensures accurate, uniform results while its large pre-packed baskets allow for easy and efficient transfers between operations. This etcher/asher has a large source-to-substrate distance, which offers increased lifetime and higher field uniformity, enabling high etch rate and low etch depth variations. Additionally, its optional bipolar frequency-modulated power supply technology enables the removal of slow-diffusing polymers and resists. LAM RESEARCH 4400 also has autonomous and a semi-autonomous wafer handling capability for fast and easy loading, unloading, and masking. Its intuitive Windows-based user interface provides reliable communication and convenience. 4400 is capable of performing various etching and ashing applications, such as MEMs and NVM applications, SIR (Simultaneous Oxide etch and Removal), poly gate etch, hard mask open etch, poly and oxide etch, poly oxide strip, oxide oxide strip, oxide planarize, poly-well etch, poly-surface etch, and hard dicing. This etcher/asher offers a wide range of recipe capabilities and allows adjustable step combinations to adjust exposure times and gas flow/pressure. Additionally, it features low process portfolio costs, high throughput, and improved cycle times. To ensure safe operations, LAM RESEARCH 4400 offers a comprehensive monitoring unit with sensors for pressure, temperature, and chamber purging. This etcher/asher also provides optional support for cryogenic gases and offers a high resolution lens machine for alignment accuracy. Overall, 4400 offers unparalleled levels of performance and productivity, making it one of the best etcher/asher systems on the market today.
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