Used LAM RESEARCH 4400B #293747957 for sale
URL successfully copied!
Tap to zoom
LAM RESEARCH 4400B is an etcher/asher tool used in microelectronics and semiconductor manufacturing. It is specifically used for exposing photoresist on a variety of substrate materials such as silicon wafers and copper foils. The tool offers superior uniformity and repeatability by utilizing state-of-the-art advanced plasma technology to deliver precise etching and etch selectivity results. 4400B etcher/asher features an innovative dual chamber design, which provides optimal plasma control and superior process selectivity. The tool includes an upper entry antenna chamber, which is used to generate the plasma, and a lower showerhead chamber, which is used for uniform gas delivery for the actual etching process. The antenna chamber has a 6-inch Odorless plane surface to ensure that there is no screen uniformity problems. Additionally, the upper chamber has two Electron CycloStrobillation sources, which are the source of high frequency alternating current for the process. The lower chamber of LAM RESEARCH 4400B is the critical zone for process uniformity. The showerhead chamber contains a concentricity adjustment feature, which ensures uniform gas delivery during the etching process. It also has a sound absorption system to reduce reflection and noise during the etching process. 4400B etcher/asher is equipped with advanced process control software to control the etching process. It can perform advanced processes such as anisotropic etching and selective-area etching with precision. The tool can also perform plasma doping, which can be used to improve the microstructure and electrical properties of the substrate materials. LAM RESEARCH 4400B tool features a high reliability design that makes it an ideal choice for high-volume production. The tool is designed to operate 24/7 and deliver superior throughput design. The tool is designed for easy maintenance as well, with a modular plasma source and low cost of ownership. 4400B etcher/asher is an ideal choice for a variety of semiconductor and microelectronics manufacturing applications. It is designed to deliver superior process performance without compromising on quality, uniformity, and cost.
There are no reviews yet