Used LAM RESEARCH 4400B #293749164 for sale

LAM RESEARCH 4400B Etcher/Asher is a semi-automatic equipment used for processing integrated circuit (IC) substrates. 4400B provides precise chemical delivery and control in a variety of fabrication processes. It includes a unique, versatile design that allows it to be used as either an etching or an ashing system. The main component of LAM RESEARCH 4400B is its patented vertical wafer stage. This stage is used to hold and spin the substrate at adjustable speeds and angles, allowing optimized etching and ashing results. The design of the stage also permits the etching process to be tailored to the substrate's requirements. 4400B is equipped with precise resistive and capacitive sensors for measuring substrate uniformity. In addition, a multi-zone gas manifold enables both efficient gas delivery and precise control of the etching and ashing parameters. LAM RESEARCH 4400B comes with two motion control systems which offer complete control over the processing of substrates. The first is a linear track unit which provides quick and precise motion control along the vertical axis. This allows for excellent edge profile control and allows the wafer stage to be moved to any position in both the x- and y-axis quickly and accurately. The second motion control machine is a rotary stage tool which allows the wafer stage to be rotated accurately and quickly while maintaining control of the substrate's profile and thickness. 4400B is also equipped with a variety of advanced features that enable users to optimize their etch and ash processing. This includes the ability to perform both isolated spot etching and deep etched profiles. It also includes a high-level software suite that allows users to program their own recipes and store them in a database. Additionally, LAM RESEARCH 4400B includes automatic safety features, such as a power outage backup and an interlock asset. 4400B Etcher/Asher is a reliable and versatile model perfect for IC substrate processing. Its patented design combines precise motion and gas control, advanced safety features, and an integrated software suite to enable users to optimize their etch and ash processes. Its flexibility allows for fast and efficient substrate processing, leading to higher yields and lower costs.