Used LAM RESEARCH 4420 #199860 for sale

LAM RESEARCH 4420 is an etcher/asher designed for chemical vapor deposition (CVD) and etching processes. It has four simultaneous chambers, which allow users to run two etch and two deposition processes, for an efficient chemical processing operation. This model is suitable for a wide range of etch and deposition processes, including metals, plastics, ceramics and adhesives. 4420 offers a versatile and user-friendly interface, allowing users to easily program, monitor and control the equipment. LAM RESEARCH 4420 etcher/asher is equipped with dual-compartment annular chambers and RF/DC power supplies, allowing users to generate a variety of plasma characteristics to suit their application requirements. The chamber has the ability to accommodate wafer sizes larger than 6", enabling a larger deposition area. The model has a temperature capability of up to 450°C and can be used with a range of process gases, including Ar, N2, Oxygen, SF6 and CH4. The model is engineered with a load-lock chamber, allowing automatic loading and unloading of wafers from the chamber. This feature helps to reduce loading and unloading times, and improves productivity. 4420 also features a unique two-machine system, allowing two batches of wafers to be processed independently with separate recipes. This gives operators more control and creates more flexibility for their production needs. LAM RESEARCH 4420 is powered by LAM RESEARCH Process Expert Unit (XPES) software suite, which is designed to simplify the operation of the machine. Users can easily program and monitor their processes through the XPES software, giving them control over their recipes, setup times, and process conditions. XPES also provides a range of diagnostic and reporting capabilities, allowing users to quickly identify any tool issues and troubleshoot them accordingly. The XPES software is also compatible with a range of industry-standard data formats and operating systems, making it an ideal asset for integration into an existing network. 4420 is designed to provide a reliable etching and deposition solution that is easy to program and control. The dual-chamber design and high-efficiency process chambers provide users with a wide variety of options to choose from, and supports a wide range of applications. The user-friendly XPES software suite helps simplify the operation of the model and enables users to quickly identify any issues, responding quickly and with high-quality results.