Used LAM RESEARCH 4420 #9137679 for sale

LAM RESEARCH 4420 is a state-of-the-art etcher / asher built to meet the most exacting requirements for device fabrication. 4420 is a full-featured equipment with an integrated platform, hosting a process chamber, exhaust chamber, and all the necessary components for process control operations. With LAM RESEARCH 4420, users can create patterns on substrates without physically masking or depositing material. As a result, 4420 is a versatile tool for all levels of fabrication, from prototyping to production. LAM RESEARCH 4420 process chamber contains numerous features designed to ensure accurate etching of substrates. The chamber is designed with a high-temperature tolerance, and a CCD camera is included for real-time process monitoring and analysis. Two separate processes can be run simultaneously, and the chamber can be sealed for optimum semiconductor-grade vacuum. 4420 incorporates sophisticated control systems and process gases. The control system consists of a computer-controlled platform that regulates the plasma process parameters and the flow rates of process and purge gases. The process gases employed with this unit include fluorocarbons, chlorine, fluorine, and oxygen, as well as other elements for nearly any etching application. LAM RESEARCH 4420 etcher / asher is also equipped with advanced exhaust systems. This reduces particulate and chemical contamination from the exhaust machine and minimizes the release of hazardous materials into the environment. An effective safety feature of 4420 is the induction oven, which is used for wafer burn-off prior to any processes. This ensures that all residual films are completely removed before the etching process begins. Additionally, the tool also has an over-temperature shut-off feature that halts the procedure if the wafer temperature rises to a dangerous level. LAM RESEARCH 4420 etcher / asher provides superior precision and control in the etching process. Its high-tech components ensure a quality product, its safety features protect both the operator and the environment, and the exhaust asset keeps the atmosphere clean. This model is therefore an ideal choice for all levels of device fabrication.