Used LAM RESEARCH 4420 #9144790 for sale

LAM RESEARCH 4420 is an advanced Asher / Etcher designed to provide precise and accurate pattern transfer to a wide range of materials. It is a powerful tool that enables users to create and refine high-precision electrical and mechanical structures that enable faster and more accurate fabrication and assembly. 4420 comes equipped with a high-end plasma source, which is capable of producing extremely uniform, tightly packed tracks that can be used for high-precision, intricate etching of delicate structures. The source also produces very high ion beam current densities that enable extremely short etching times for high-precision circuit-level patterns, enabling faster time-to-market for products. LAM RESEARCH 4420 also offers a very high level of accuracy and etch rate, up to an accuracy of 3% to 50 microns and an etch rate of up to 18 microns per second. This is ideal for applications such as integrated circuit fabrication, where it is able to quickly produce complex patterns with very high precision. Additionally, 4420 is equipped with a zero-beam deflection system that ensures a consistent beam path, enabling more precise pattern transfer and preventing any potential damage to the materials being etched. LAM RESEARCH 4420 also provides a wide range of features that give users enhanced control over their process. For example, fast-scanning air-pulse capabilities enable users to control the etching speed, etch rate and beam stabilization, while an integrated vacuum system ensures that the etching is done in a clean atmosphere. Additionally, 4420 is able to handle a variety of substrates, from wafers and thin-film substrates to thick-film substrates and quartz substrates. Overall, LAM RESEARCH 4420 is an advanced Asher / Etcher designed to provide accurate and precise pattern transfer with a wide range of substrates. It provides a high degree of accuracy and etch rates, as well as a wide range of features, such as fast-scanning air-pulse capabilities and an integrated vacuum system, that give users a high degree of control over their process. 4420 is ideal for any application requiring fast and precise pattern transfer or etching.