Used LAM RESEARCH 4420 #9145514 for sale

LAM RESEARCH 4420 Asher/Etcher is a powerful, high-yield production etching equipment designed to quickly and accurately process various sample materials. This system uses an advanced plasma etch process to create precise circuit patterns on a range of substrates while also delivering reliable performance and high deposition rates. 4420 is equipped with a dual src jigs and lids, allowing users to quickly switch between multiple substrates during operation. This etching unit is designed with a number of smart features available to ensure optimal etch accuracy and quality, such as motorized wafer motion, a hydrodynamic lift stage, and an automated weatherboard ability. Additionally, LAM RESEARCH 4420 Etcher/Etch machine offers users a wide range of features to give them the precision, control, and repeatability they need for quick fabrication of components. 4420 Etcher/Asher utilizes a powerful PlasmaJet technology for clean, precise etching at high throughput levels. This technology combines a high-efficiency etch adapter with a new, high-energy source plasma technology to give users the best of both worlds — high deposition rates and low material damage. LAM RESEARCH 4420 is engineered to get the most out of its new plasma technology, producing high-performance etching results in a fraction of the time. The plasma source can be laser tuned to settings which will yield different etch process results, contributing to 4420's versatility. The integral Hydrodynamic Lift Stage of LAM RESEARCH 4420 device is designed to give users more control over the chamber bottom wall etch time. The adaptable Hydrodynamic Lift Stage operates with a revolving wheel design, allowing users to adjust etching time based on the needs of their specific sample. Additionally, 4420 has been designed with a variety of automated weatherboard abilities, giving users full control over the pressure settings when etching. Furthermore, LAM RESEARCH 4420 tool is also equipped with advanced software which can be used for etch optimization, as well as process consistency tracking. The intuitive user interface of this software allows users to quickly drill-down into the settings of the etch process and make modifications as needed. With the help of these tools, users are able to quickly analyze and troubleshoot any issues that might arise during process operation. Overall, 4420 Etcher/Asher is a powerful, high-yield etching asset that can provide users with the speed, precision, and accuracy they need for rapid fabrication. With its advanced PlasmaJet technology and versatile Hydrodynamic Lift Stage, LAM RESEARCH 4420 is an ideal choice for any production etching job.