Used LAM RESEARCH 4420 #9233411 for sale

LAM RESEARCH 4420 is an etcher-asher equipment, engineered for efficient and productive plasma etching and dry-ash processes. It is capable of supporting up to four process modules, providing a flexible and versatile configuration for the harsh environment of semiconductor production. 4420 offers analogue and digital plasma sources, yielding increased process control and disciplined variability in applications. LAM RESEARCH 4420 is also modified for high-density plasma processes, as well as SiOF etching and Post-ash cleaning. 4420 has an energy-efficient design, reducing energy consumption and operating costs. It has large-area process modules, allowing for higher process throughputs than comparable systems. It also features an intelligent subsystem to automatically optimize plasma parameters, provides stability and uniformity in etching results, independent of recipe selection. LAM RESEARCH 4420 offers a wide range of process capabilities and complete solution flexibility, delivering a lower cost of ownership. It can accommodate a variety of substrates and processes, such as single-wafer or batch-mode etching, mesa etching, multi-step etching, strip etching, passivating, stencil lift-off, and post-ash cleaning. With precision feature recognition and commanding, 4420 can provide high-speed etching in processes such as AMS, IPE, RIE, Ozone, and UV or UVPlus HiP-CVD. Compared to previous systems, LAM RESEARCH 4420 offers improved modularity and scalability capabilities, greatly reducing complexity and eliminating costly controls. Its integrated control system provides enhanced process management, allowing for the implementation reliability and repeatability of complex recipes. In terms of safety and environmental performance, 4420 is designed to meet the most stringent requirements. It has a variety of safety features, including multiple exhaust monitoring points and a fire containment unit. In addition, the machine is designed to minimize maintenance and downtime, and it is compliant with SEMI S2 and S8 safety guidelines. Ultimately, LAM RESEARCH 4420 offers flexible and reliable etching and ashing for today's harsh semiconductor production challenges. It delivers superior process performance and improved productivity, and is a reliable choice for both existing and new applications.