Used LAM RESEARCH 4420 #9262592 for sale

LAM RESEARCH 4420 is a single wafer, batch asher or etcher designed for high-throughput, flexible production or research processes. 4420 platform enables etch rates of up to 15nm/min and allows users to perform a variety of specialized etch processes including ion beam etch, black-silicon etch, resist strip, and oxide etch. It provides advanced process control and monitoring capabilities and is designed for precision, reliability and process reproducibility. The equipment is comprised of several primary components; a compact vacuum chamber, multi-gas delivery system, line-of-sight vision unit, susceptor rotation machine and controller. The vacuum chamber is constructed from materials such as stainless steel and aluminum which have been thermally and structurally optimized for its application. The chamber design is centred on the RIE (Reactive Ion Etch) process and includes both a primary and secondary etch stage for higher throughput. The multi-gas delivery tool enables multiple gases to be incorporated into the etching process. This allows for more flexibility when defining complex process recipes. It also enables higher etch rates than can be achieved with single gas processes. The line-of-sight vision asset is an optical microscope with built-in vision hardware, which monitors the etch process in real-time and provides process feedback to ensure process accuracy and repeatability. The susceptor rotation model uses a brushless DC motor with variable speed capability and a RS-485 controller to optimize etch rate uniformity across the wafer. The controller is the brains of the equipment and is responsible for controlling the process variables, providing accurate and repeatable results. It features an intuitive touch-screen interface, Windows-based graphical user interface, and an Ethernet connection for remote access and data retrieval. LAM RESEARCH 4420 is an advanced etcher/asher capable of performing a variety of etch processes with precision, reliability and process repeatability. Its high throughput and flexible process recipes make it an ideal tool for high-volume production and research applications.