Used LAM RESEARCH 4420 #9401523 for sale

LAM RESEARCH 4420 etcher / asher is an advanced vapor phase etch-and-clean process tool designed to provide perfect profiles and surface finishes for sensitive semiconductor substrates. The highly efficient, cost-effective system features multiple plasma sources, precision substrate handling, substrate conditioning, and process monitoring and control capabilities. 4420 etcher / asher is specially designed to provide solutions to the manufacturing challenges posed by scaling generational complexities in the semiconductor device areas. LAM RESEARCH 4420 etcher / asher uses a dual chamber design with separate reactive ion etch (RIE) and remote plasma clean (RPC) chambers. This provides users with a variety of process options, enabling them to tune process parameters to best perform a wide range of applications. The process chamber is made up of a polysilicon body and lid, stainless steel liner and quartz susceptor, with titanium coated electrodes. 4420 is a low-pressure tool, operating in the range of 0.2 - 0.4 mTorr base pressure. LAM RESEARCH 4420 also offers advanced control of process parameters and recipe development for end-developers. Process recipes can be customized to meet specific requirements for any given application. The advanced system control in 4420 enables precise control of etch selectivity and rate, etch depth and profile, angle of attack, and target surface finish. The RPC chambers in LAM RESEARCH 4420 enable low-damage etch-and-clean processes for dielectrics and materials, with an optional end point detector for enhanced process control. 4420 offers unique benefits to the user as well. Benefits include low-energy pulsation and fast temperature control which enable better temperature uniformity in the process chamber and improved yields. LAM RESEARCH 4420 is also compatible with a wide range of recipes, and the simple user interface makes developing custom recipes easy. 4420 is a versatile and reliable etcher / asher capable of an extensive range of process capabilities. This advanced system ensures precise, repeatable etch and clean performance at the highest level, providing users with flawless process outcomes and a lower cost of ownership.