Used LAM RESEARCH 4420i #9043961 for sale

LAM RESEARCH 4420i Asher is a versatile etching equipment designed for complex wafer patterns. It is a platform which is capable of replacing multiple etch chemistries and etcher configurations, allowing for a variety of applications. It features a long chamber, allowing for larger wafers with more intricate patterns, plus a wide range of mask sizes. 4420i's state-of-the-art combined-gas delivery system and uniform RF power matching ensure precise and repeatable process control, while its independent gas-mixing capability allows for particularly high process flexibility. LAM RESEARCH 4420i is capable of performing both wet and dry etcher processes. A wide variety of wet etching processes are supported, with optional accessories such as quartz and ceramic carriers for an even wider range of etching applications. With its state-of-the-art RF power-matching protocol, 4420i allows for precise repeatability and control of the etching depth. LAM RESEARCH 4420i is equipped with a high-speed load lock, enabling fast loading and unloading of wafers in a safe and inert atmosphere. An advanced cathode-coupled crystal source ensures that the etching rate is incredibly consistent across the entire wafer. Additionally, 4420i is capable of supporting both high- and low-temperature processes, reaching temperatures up to 550°C for applications like the polymerization of acrolein paste. LAM RESEARCH 4420i is powered by LAM RESEARCH exclusive FABIS-P unit, allowing for very precise process control. By automatically balancing process parameters such as power, temperature, gas pressure, and process time, FABIS-P ensures that processes are as consistent as possible from one wafer to the next. The machine can also be tuned to meet specific process requirements, resulting in highly precise etching processes. In ensuring a very reliable process, 4420i offers other features such as quartz bell isolation, independent heating zones, process-gas mixing, and flexible wafer pattern loading. Its long quartz chamber ensures every centimeter of the etching surface is exposed to the same etching parameters, while its load-lock chamber reduces contamination risk, allowing for multiple wafer programs to run in a single cycle, and reducing wafer-to-wafer variability. Finally, its high-precision RF matching systems and power ramping guarantee repeatability and uniformity. All of these features combine to make LAM RESEARCH 4420i a highly versatile and reliable etching tool. It is suitable for a variety of etching applications, such as semiconductor device fabrication, photomask making, MEMS and Bio-MEMS production, and other specialty etched applications.