Used LAM RESEARCH 4428 #293750155 for sale

LAM RESEARCH 4428 is an advanced etch/ash plasma equipment that provides superior etch and ash performance, fabrication accuracy and substrate selectivity. 4428 provides deposition rates up to 30nm/min, enabling new and more challenging patterning applications that extend beyond the traditional Si-SiGe, III-V and dielectric materials. LAM RESEARCH 4428 etching/ashing system utilizes a combination of frequency and power to avoid damaging substrates and maintain minimal defectivity. The ultra-high-speed etch/ash processes are produced by an EFAB source, a cylindrical source with a 14" diameter inner-chamber and a lid-lift access unit, integrated showerhead and remote radio-frequency (RF) electrodes. The machine provides uniform plasma performance over the entire wafer substrate by means of dual high-frequency, high-power EFAB power source and wafer-handling tool. The patented high-density RF preionization process improves etch rates and extends chamber lifetime by improving energy efficiency - and edges at single-digit nanometer-level accuracy. The patented showerhead RF electrode helps in reducing chamber conditioning and decreasing start-up time. This integrates with the in-situ cleaning asset, which removes particle deposits before etching and extends maintenance intervals. The model offers adjustable bias to optimize profiles and minimize etch uniformity issues. The equipment also extends pneumatic wafer clamping capabilities enabling complete wafer contact. It features an advanced chemistry delivery system that enables a wide range of processes, with up to three end-pointing techniques - resistivity, thickness, and chamber pressure. This ensures that the chamber operates under optimal conditions to ensure maximum etch rates with minimal defectivity and minimal substrate damage. Last but not least, the integrated chamber design has been improved to be much more efficient, reducing the total cost of ownership through consumables savings. 4428 etch/ash plasma unit is the ideal choice for challenging patterning applications that require high performance and ISO class 5 cleanliness.