Used LAM RESEARCH 4450 #9226299 for sale

LAM RESEARCH 4450
Manufacturer
LAM RESEARCH
Model
4450
ID: 9226299
Wafer Size: 5"
Vintage: 1990
Etcher, 5" 1990 vintage.
LAM RESEARCH 4450 is an etcher/asher used for deep anisotropic etching of high aspect ratio structures in semiconductor materials. 4450 is a general purpose etcher/asher capable of etching or ashing in both wet and dry processes. It has a digital quartz controller and high-power radio-frequency generator for precise control of process parameters, and a wide variety of process chemistries to choose from. LAM RESEARCH 4450 offers several advantages over manual etching or ashing processes, including high repeatability, precise control, and flexibility. It is designed to be a single tool with all the necessary features to etch or ash most semiconductor materials, including silicon, gallium arsenide, and indium phosphide. 4450 is also capable of etching materials such as metals, ceramics, and glass. LAM RESEARCH 4450 features a compact design with a single compact intrusion apparatus, which allows for tight-design processes. It is also equipped with a microprocessor-based controller, which enables monitoring and parameter setting of the etching and ashing processes. 4450 also has an integrated exhaust system for handling of any gaseous or aerosol byproducts of the process, as well as a vacuum pump to evacuate the chamber in between runs. LAM RESEARCH 4450's primary feature is its high-power RF generator, which enables precise and repeatable control of etching and ashing parameters. It comes with a wide variety of process chemistries which can be used for etching or ashing in both wet and dry processes. The parameters such as frequency, pulse width, and duty cycle can be precisely adjusted for excellent process control. 4450 is a versatile tool for etching or ashing of high aspect ratio structures in a variety of materials. Its compact and precise design makes it a reliable choice for deep anisotropic etching and ashing. Its digital controller and RF generator enable precise control of etching and ashing processes and its wide variety of chemistries provide full flexibility for a broad range of applications.
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