Used LAM RESEARCH 4500 #9226300 for sale

LAM RESEARCH 4500 is an etcher/asher equipment used for isotropic and anisotropic etching of semiconductor wafers. It is a cutting-edge piece of equipment that incorporates advanced technologies such as robotics and wet chemical processes. With a chamber size of 36" and a power rating of 500 watts, 4500 is designed to provide excellent performance in a variety of production environments and etching requirements. The system features two process chamers: the pre-etch chamber, where deposition and chemical etches are performed; and the etch chamber, where the wafer is placed in an isotropic etching field. As well as providing a secure environment for reliable etching, the unit also provides other components such as the in-situ RF etch source, in-situ cleaning machine, gas manifold, and automatic wafer handling tool. The asset is designed for high-performance etching of silicon wafers, as well as gallium arsenide (GaAs) and other semiconductors. Etching profiles can be customized to optimize precision, speed and complexity. Through the use of automated processes and in-situ RF etch sources the model delivers the performance and reliability required of processing engineers. LAM RESEARCH 4500 is capable of running in a range of temperatures, from 250°C (482°F) to 650°C (1202°F). It also utilizes advanced industrial motion systems to provide accurate results, offering repeatable performance. The equipment includes ceramic/metal/plastic chambers to resist any potential contamination of the wafer. Finally, 4500's comprehensive process monitoring system provides dependability and tracking for the production environment. This unit simplifies the data-gathering process, allowing for quick and easy communication between the engineer and the machine. LAM RESEARCH 4500 offers a fast, accurate, and reliable solution for isotropic and anisotropic etching for semiconductor wafers.