Used LAM RESEARCH 4500B #9226626 for sale

LAM RESEARCH 4500B etcher/asher is an essential tool for the accurate and efficient manufacture of semiconductor chips and advanced materials processing. It is designed for professional use in production and design environments, and features sophisticated automation, advanced process monitoring and performance data feedback capabilities. 4500B is capable of advanced etching and ashing processes, with the ability to manipulate etchant gases, hydrofluoric acid, photoresists, chemicals, solvents and slurry media. Its high versatility allows the implementation of non-uniform etching and ashing processes, such as damascene, deep trench etching and local ashing, while maintaining tight process control with repeatable results. The unit includes a number of features to streamline production, such as a built-in cooling system and a gas-flow pattern that is optimized for etching and ashing processes. It also features a gas rack for operator-adjustable gas delivery, temperature control, and a customizable workstation for easy loading and unloading of samples. The built-in analyzer module allows for real-time monitoring and feedback of the process parameters, ensuring consistently accurate results. LAM RESEARCH 4500B is designed to provide long-term, reliable operation, with advanced protection mechanisms that ensure the safety of both the unit and its environmental surroundings. Its stainless steel and aluminum construction provides it with robust durability, and a proprietary cooling system ensures consistent performance under varying levels of workloads. The unit is compatible with a range of substrates, including both single and multilayer films, ceramic and metal-coated films and steel carrier substrates. It also supports integral process control through an easy-to-use software interface, allowing the operator to quickly and accurately set and adjust process parameters. In conclusion, 4500B is a powerful and reliable option for the etching and ashing of advanced materials. Its comprehensive array of features and comprehensive protection protocols make it an ideal tool for production environments, allowing for tight process control and consistently accurate results.