Used LAM RESEARCH 4500i #9250092 for sale

LAM RESEARCH 4500i is a dry etcher / asher specifically designed for advanced semiconductor device fabrication. It uses a unique combination of three etch technologies - Plasma Enhanced Chemical Vapor Deposition (PECVD), Reactive Ion Etching (RIE) and Inductively Coupled Plasmas (ICP) - to achieve a wide range of desired etch profiles on substrates. This versatile etching tool can be used for trench and contact etching in metal gates, spacer etching for STI, damascene and dielectric etching for interconnects, wafer trimming and back side etching applications. 4500i is capable of multiple wafer sizes up to 200mm with substrate temperatures up to 300°C. LAM RESEARCH 4500i is an exceptionally advanced etching system with many distinct advantages. It incorporates an extensive range of technical features, including the integration of a fast quadrupole mass spectrometer (QMS), a large quartz chamber with a maximum load of up to 26 wafers, and a variety of process gases available for etching. The LCD-controlled multi-gas dynamic supply system obtains optimal process conditions for dynamic processes, and a built-in high-performance rapidly cooled plasma (RPC) generator minimizes unwanted power overshoot and maximizes process control. Furthermore, 4500i is equipped with Piezo Tune-and-Lock (PTL) technologies for superior process repeatability on high aspect ratio features. LAM RESEARCH 4500i is the premier etching / ashing tool for advanced semiconductor fabrication. Its impressive array of features and capabilities provide superior process stability and control, thereby enabling higher-quality device fabrication in a shorter time frame. Highly advanced process monitoring and local exhaust systems ensure safe and clean processing operations. With its multi-gas dynamic supply system and Piezo Tune-and-Lock technology, 4500i is a must-have etching and ashing solution for superior device fabrication.