Used LAM RESEARCH 4520 XL #293625775 for sale

LAM RESEARCH 4520 XL is a state-of-the-art etcher and asher designed to enable precise and repeatable processing of advanced microelectronic materials. It is suitable for a variety of materials and processes, from piezoelectric crystals to compound semiconductors. LAM RESEARCH 4520XL offers fast, efficient processing on 6" or 8" wafers up to 200 mm, with no wafer breakage, allowing for ultra-high throughput without sacrificing productivity or repeatability. 4520 XL uses advanced etching and ashing techniques to enable robust and repeatable processing. Its high-precision control systems minimize variability and provide exact control over the parameters that determine good etch or ashing performance, ensuring repeatable results. 4520XL is fully programmable, allowing parameters to be easily set, adjusted and fine-tuned to match the process requirements. LAM RESEARCH 4520 XL has a high-power-density plasma source for greater flexibility in etching and ashing applications. It also features variable-frequency power supplies that can deliver peak power levels up to 24kW, with a 0-1000V source voltage range, and a 0-10A source current range. This power range allows for fast, efficient etching and ashing, even with challenging materials. LAM RESEARCH 4520XL is equipped with a high-precision positional sensor equipment that maintains sample position accuracy to ensure repeatable results. It also includes an efficient gas delivery system and a comprehensive gas management unit with an automatic leak detection machine. 4520 XL is also equipped with an automated cleaning tool that enables multiple clean cycles with minimal user intervention. This asset also has optional features such as a quartz heater, a wafer-temperature sensor, and a programmable wafer rotation for high-quality cleaning performance. 4520XL is easy to operate and maintain, with clear and understandable onboard displays. It is designed to be a reliable and efficient etcher and asher, ideal for high-volume production, as well as for more complex research and development processes.