Used LAM RESEARCH 4520 XLE #9173004 for sale

LAM RESEARCH 4520 XLE
ID: 9173004
Lot of spare parts Qty Part number Description (2) 796-093088-005 Gate valve controllers (3) - Silicon edge rings (5) - Quartz baffle rings (5) - Quartz keyed stepped rings (4) 715-011622-101 LAM 4pin lifts (10) - Screw flat heads, NYL, ¼-­‐20 x 1-­‐1/4 (2) - Upper silicon electrodes.
LAM RESEARCH 4520 XLE is a premium etch dual magnetron etcher/asher specifically designed for processing advanced logic devices. The system offers two processing configuration options: batch process or semi-continuous process. The machine is designed for processing of both fully etched and partially etched layers in advanced devices. The etcher's batch process makes it highly suitable for advanced device processing and offers superior uniformity, atom mobility and complete process control over the desired results. The system is configured with an automated, pulsed, dual magnetron etcher and asher that deliver superior pulse characteristics and superior uniformity, including an adjustable time-base configuration to ensure the desired result. 4520 XLE also includes an advanced wafer cassette, which offers a convenient level of access to the wafers during processing, making it more efficient and easier to maintain. The machine has been designed to be extremely reliable, offering superior process repeatability and uniformity, as well as improved process yield, when compared to other industrial etching systems. LAM RESEARCH 4520 XLE is also highly configurable. It is loaded with state-of-the-art features and offers a wide variety of user-selectable process parameters, including etch rate, pressure and polarity, selectivity, and throughput. The machine is designed for quick and easy maintenance and can accommodate an array of maintenance tools and replacement parts. In addition, 4520 XLE is equipped with advanced security features, which helps to ensure that user data is maintained and secure. LAM RESEARCH 4520 XLE is the ideal choice for any advanced device processing project. Its reliable performance, superior uniformity and process control options, as well as its ability to process both fully etched and partially etched layers, make it the ideal solution.
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