Used LAM RESEARCH 4520 XLE #9188552 for sale

LAM RESEARCH 4520 XLE is a high performance etching or ashing instrument designed for use in research labs and production facilities. With an advanced dual plate drive equipment, the XLE offers superior precision, accuracy and repeatability for etching at low temperatures. Its extreme low-temperature etching capability, combined with the ability to perform variable rate etching, makes it ideal for etching substrates for both research and production applications. An intuitive user interface allows for precise program settings and system monitoring, while the integrated real-time nitrogen (N2) control unit ensures process repeatability. The XLE's proprietary control machine and multi-level plasma control algorithms allow for precise etching control. Its multiple chucking systems offer precise, fine alignment of substrates during etching. The XLE offers multiple test stand options, allowing users to configure the tool to perform etch or ashing processes on different substrates. An integrated data acquisition and monitoring asset allows users to ensure repeatable conditions during the etching process, while an arcing detection model ensures safety and quality control during etching. In addition to its dual plate drive equipment, the XLE also features several additional features that maximize performance. Its modular design allows it to be easily integrated into existing systems and its integrated vacuum control system ensures precise pressure and flow within the chamber. The XLE is equipped with a high-powered infrared imaging unit, allowing for precise temperature control throughout the process. In addition, the XLE offers a remote diagnostics machine for monitoring of conditions within the chamber. 4520 XLE is an advanced etching and ashing instrument that offers superior precision, accuracy, and repeatability. Its advanced dual plate drive tool allows for precise etching control and the integrated real-time nitrogen control asset ensures process repeatability. Its modular design allows it to be easily integrated into existing systems, while its infrared imaging and arcing detection systems ensure accurate and safe etching. The remote diagnostic model provides real-time monitoring of chamber conditions, allowing for precise control.