Used LAM RESEARCH 4520 #9167744 for sale

LAM RESEARCH 4520 is a robust, reliable advanced reactor etcher/asher for technical processes. With its innovative design that offers high performance etching and deep reactive ion etching (RIE), it is ideal for a variety of etching processes such as deep trench etching, dual damascene etching, and contact hole etching. The etcher/asher features modular design, multiple process chambers and high flexibility, allowing users to expand their wafering integrated processes without additional system redesign. It has a compact footprint making it easy to install and fits into most cleanroom configurations. The etcher/asher is equipped with precision process control capabilities and intelligent hardware capability, effectively automating stringent processes. It supports dual run capability and enables load-lock cloning to minimize thermal budget and enable long run times. The gas control unit of 4520 is integrated with full range of diagnostic and analysis software, providing precise temperature and pressure regulation. It is equipped with an advanced, powerful control system engineered with heated lines and electrodes and a self-diagnostic error system, ensuring high reliability of the equipment. The plasma source of the LAM LAM RESEARCH 4520 is powered by a state-of-the-art power supply with high operating efficiency and high plasma density. It can reach high selectivity in etching process and preserves the profile of the patterned masks. The reactor delivers good etch uniformity and excellent step coverage, with minimal costly process over-etching and edge-beading. The LAM 4520 is a highly advanced etcher/asher that perfects any etching or ashing process. It offers users full precision control and automation, flexible integrated process and high reliability, which results in an optimal wafer processing performance.