Used LAM RESEARCH 4520 #9243876 for sale

LAM RESEARCH 4520 Asher is a physical vapor deposition (PVD) etcher designed to produce products with a high degree of uniformity and performance. This equipment is capable of performing etching, micro-fabrication, and thin-film deposition processes. It is a cost effective tool for the submicron features required for semiconductor processing. 4520 Asher has a unique feature that allows for a rapid transition between etching and thin-film deposition processes, optimizing the production cycle time. It has an advanced process chamber design that provides quick processing times and uniformity over large wafer sizes. The entire etch process is completely closed loop wet and dry. LAM RESEARCH 4520 Asher features a dual nozzle system that allows for the deposition of anisotropic or layer-by-layer deposition, as well as non-controlled etching. This makes it especially useful for etching processes that require a large amount of precision and control. The unit can process multiple wafers up to 8" in diameter and up to 1" thick in a single run. 4520 Asher is a robust and reliable tool that offers repeatable, reliable results. Its high process speed and extensive range of process options allow users to quickly and accurately etch their desired products. This machine is designed to process a range of low-end products, such as Lateral Field Isolation and Gate Cut, up to the most complicated FEOL structures. LAM RESEARCH 4520 Asher provides operators with comprehensive process support, including comprehensive Recipe Development and Monitoring, along with full on-board Scanning and Diagnostic features. In addition, it includes several additional features such as 3D imaging capability, and a range of automation features such as Auto Naming and Tracking features. In conclusion, 4520 Asher is a powerful and dependable etching and thin-film deposition tool that is capable of meeting a wide range of etching, thin-film deposition, and micro-fabrication product requirements. This asset is designed to provide repeatable and reliable results and is suitable for a wide range of production environments.