Used LAM RESEARCH 4520 #9389918 for sale

LAM RESEARCH 4520 is a cluster platform etcher / asher designed to deliver the precision, speed and quality control necessary for semiconductor device fabrication. This equipment consists of multiple high-precision etching and ashing chambers with an advanced chamber control system and an integrated mass flow controller. 4520 is designed to provide extremely fast throughput and reliability, with parallel processing capabilities and high-temperature processing. LAM RESEARCH 4520 etcher / asher features three advanced etching and ashing chambers, each of which is optimized for different types of processing. The plasma etch chamber is designed for plasma cleaning, sample pre-treatment, etching and ashing of wafers. It is capable of processing wafers up to 5 inches in diameter, and is equipped with a variable frequency drive for precise control of the process parameters. The ultra-high-density chamber is ideal for ultra-high-density etching and ashing of wafers, and is capable of processing wafers up to 8 inches in diameter. It is also equipped with a range of advanced integrated components for precise process control. Finally, the wet etch chamber provides high accuracy wet etching and ashing, and is equipped with an integrated laminar flow controller, temperature controller and pressure sensor. The etching and ashing process on 4520 is controlled by a series of advanced components, including a PLC based on Siemens Simatic S7, which provides precise and accurate control of the process parameters. An advanced process controller is also integrated which monitors the temperature, time, pressure and reaction conditions in real-time, and provides automatic process optimization for maximum precision, accuracy and yield. The unit also features an advanced mass flow controller which ensures precise control of the feed gases and actives, to provide stable process parameters with each etch/ash cycle. The machine also features a wide range of diagnostic tools, such as cryogenic scanning electron microscope, X-ray photoelectron spectroscopy, residual gas analyzer and surface profiler. These tools provide precise control over the etch/ash process, enabling accurate control of the process parameters and the ability to monitor and troubleshoot any process issues. LAM RESEARCH 4520 is designed for extreme reliability and high-temperature processing and offers advanced capabilities, including parallel processing of multiple wafers and recipe storage for easy recall of process steps. The tool is also equipped with an advanced process control software package which provides recipe-based automatic process control, as well as a user-friendly interface for optimizing the asset. In addition, 4520 includes a range of advanced safety features, including a maintenance mode which allows for safe operation of the model even when a process step fails. Overall, LAM RESEARCH 4520 is an advanced and reliable etching and ashing equipment which is ideal for semiconductor device fabrication. It provides extremely fast throughput and reliability, with precise control of process parameters and advanced diagnostics, making it a valuable tool for achieving maximum precision and yield.