Used LAM RESEARCH 4520 #9389919 for sale

LAM RESEARCH 4520
Manufacturer
LAM RESEARCH
Model
4520
ID: 9389919
Oxide etcher, 6" Clamp classic.
LAM RESEARCH 4520 etcher / asher is a state-of-the-art device specifically designed to deliver superior performance in etching and ashing applications. 4520 is intended for use in semiconductor processing and provides reliable, repeatable results for a variety of applications. The etcher / asher features a large, 20-inch by 12-inch work chamber that makes it easy to accommodate even large substrates. It is equipped with advanced, user-controlled process parameters to ensure that the most ideal conditions can be achieved for the specific etching or ashing process being used. Temperature controls are regulated to within ±0.5°C of the set-point, allowing for accurate and reproducible results. LAM RESEARCH 4520 also features a compact, energy-saving design and includes advanced options such as hot edge robotic handling and remote process monitoring with data logging features. It provides accurate and consistent etch uniformity across the entire substrate by utilizing an RF plasma source and a fully adjustable, closed-loop feedback control for repeatable, high-quality processes. For enhanced safety, it is equipped with a number of safety features such as vacuum exhaustion monitors, shielded walls to prevent electrical hazards, and interlocks that prevent improper door opening during operation. Additionally, 4520 has a replaceable, durable 304-grade stainless steel interior for easy cleaning and longer life. In addition to being easy to use and maintain, LAM RESEARCH 4520 is compatible with a range of process gases and liquid precursors. It is ideal for applications such as deep etching, ashing, and RIE processes, as well as specific substrates such as silicon carbide, gallium arsenide, gallium nitride, molybdenum disulfide, and many others. Overall, 4520 etcher / asher is an outstanding device that is capable of delivering repeatable, consistent results - in a user-friendly manner - for a range of etching and ashing processes. Its advanced features, exceptional temperature control, and energy-saving design make it an ideal choice for labs and industries requiring efficient, reliable surface handling operations.
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