Used LAM RESEARCH 4520i #9233410 for sale

LAM RESEARCH 4520i is an advanced etcher / asher equipment used for semiconductor applications. It is designed to provide high uniformity, precision etching, and ashing processes. The system features a high-vacuum, Peltier-cooled, radio frequency-powered plasma generating module, making it ideal for critical processes that require a tight concentration of plasma properties. This feature makes it suitable for application processes such as etching of ultra-thin films and substrates. 4520i has an on-board controller, providing the user with an interface to customize and adjust equipment settings. It also has a large chamber size and automatic substrate and mask loading to facilitate higher throughput, a feature which is especially useful in semiconductor production. Its electrodes are designed to deliver a strong plasma, enabling precise and fast etch rates with low-energy consumption. Furthermore, it features low-temperature operation for increased etch safety. The unit also offers a variety of standard post-etch operations and vacuum processes, including cooldown and radical removal. This allows for greater flexibility in etching processes and reduces the need to hire additional technicians. Furthermore, the etch and ashing machine comes with advanced hardware and software which make the entire process easier to control and manage. In conclusion, LAM RESEARCH 4520i is an incredibly advanced etching / ashing tool, providing users with high precision and uniformity, as well as a range of standard post-etch processes and vacuum processes. It is ideal for critical processes, such as etching of ultra-thin films and substrates, and its on-board controller offers the user more control over the process. It also offers a large chamber size and automatic substrate and mask loading. All of these features make 4520i a great asset for high-volume production and precision etching processes.