Used LAM RESEARCH 4526 #9135993 for sale
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ID: 9135993
Wafer Size: 6"
Oxide RIE etcher, 6"
HINE 38A Indexer
Clamp
ADVANCED ENERGY PDW2200 RF Generator.
LAM RESEARCH 4526 is an etcher/asher designed for semiconductor wafer processing. This multi-purpose instrument is capable of etching and ashing a wide range of materials including photoresist, metals, oxides, nitrides, and others. It is a versatile tool that is used for an array of applications such as patterning, doping, etc. This system is equipped with two powerful plasma sources that enable it to process wafers up to 200mm in diameter in a maximum temperature range of up to 385°C. This machine also has advanced temperature control and uniformity monitoring which allows users to heat or cool the samples with precision. Additionally, 4526 is equipped with a high speed downstream robotic Gantry, enabling fast and reliable material transfer. The system comes with advanced software capabilities such as defect tracking and automatic chamber cleaning, as well as a variety of process recipes that can be used to tune the etching and ashing processes to different substrates. This allows users to create customized etch recipes for each application, ensuring superior process results. Due to its flexibility, LAM RESEARCH 4526 is suitable for a wide range of production processes. The machine is designed to optimize wafer throughput, increase yield rates, and reduce contamination. Additionally, the robust control suite and intuitive software greatly improve the machine's versatility and user-friendliness. This makes it an excellent choice for both research and industry applications. All in all, 4526 is a reliable and versatile etcher/asher, designed to meet the needs of users. Its advanced features, together with its high performance, make it a wise choice for any wafer processing laboratory.
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