Used LAM RESEARCH 4526 #9249911 for sale

LAM RESEARCH 4526 Asher/Etch Equipment is a reliable, efficient asher/etch system designed to provide uniform processing coverage across a wide range of substrates. This unit is an excellent choice for medium to high-volume production runs, enabling the handling of a wide variety of substrates, and allowing for a broad range of process chemistries. The machine features a robot-mounted RAIE (remote atmospheric-controlled) etch chamber as well as an IC metallization chamber for the deposition of metals and dielectrics. The robot articulates four independent robot arms, composed of upper and lower arms, allowing the tool to handle both intricate surfaces and smooth surfaces. 4526 is equipped with one of the most advanced Level IV process controller technologies available, providing fast processing speeds and eliminating the need for manual adjustments. Its user-friendly touch-screen interface allows users to see all processes in real-time, while a library of process recipes and templates allow for a high level of process repeatability and control. LAM RESEARCH 4526 also features advanced safety features, such as a physical safety key, on-board safety laser grid, and an anti-misalignment, anti-burying protection function. In addition, the asset includes in-line inspection and detailed process monitoring capabilities, allowing for production runs that meet the highest demands. 4526 model boasts a wide range of process capabilities, including reactive etching, polishing, depassing, annealing, and spin-on/isolation cleaning. It has a high-precision capability of +/-1 micron accuracy, allowing for precise trimming and formation of small semiconductor components. Furthermore, the equipment's high-vacuum sealed etching environment ensures uniform profiles and the highest process yields. Overall, LAM RESEARCH 4526 Asher/Etch System is an efficient and reliable solution for medium- to high-volume production runs. Its advanced features and user interface enable a high level of process control, ensuring uniform processing coverage across a wide range of substrates and excellent process yields.