Used LAM RESEARCH 4528 #9011007 for sale

LAM RESEARCH 4528 is an etcher/asher equipment designed for the high precision etching of silicon wafers. This system allows for precise etching or ashing of silicon wafers in both perfectly defined patterned and random patterns. The unit can support both batch and single wafer processing with accuracy of up to 1 micron. The pressure, temperature and dopant concentration used in the etching process can be accurately adjusted to meet the needs of the application at hand. The machine comprises of two chambers, the main chamber and the upper chamber. The main chamber houses the plasma generator, gas cracker, shower head injectors, high current power supplies and other components. The upper chamber contains the loading and unloading baskets or pods and the pre-conditioning tool. The plasma created in the main chamber is used to etch the wafers in the upper chamber, while the incubation asset, present in the upper chamber, helps to maintain the consistency of the etching process. The model runs at a temperature ranging from 70-150 degrees Celsius and a pressure ranging from 1-10 Torr. With its integrated process control and in-situ diagnostic capabilities, the equipment is able to provide a continuous and consistent etching process. The integrated process monitoring allows for close and accurate control over the etching process with the ability to detect any changes in the process parameters, such as temperature, pressure or dopant concentration, and rectify them within seconds. The system is also capable of precise etching and ashing of silicon wafers with uniformity of up to 1 micron. The unit also provides a uniform gas distribution, which ensures an even and uniform etching of the wafers. The gas quality is accurately controlled throughout the etching process, providing a consistent etching and uniform surface finish. The machine also allows for multiple wafers to be etched in one process, eliminating the need for manual handling and loading of each wafer. 4528 is an advanced etcher/asher tool designed for high precision etching of silicon wafers. With its accurate process control, precision etching and uniform gas distribution, this asset is preferred by many fabs for its reliable results and repeatability.