Used LAM RESEARCH 4600 #293764324 for sale

LAM RESEARCH 4600
Manufacturer
LAM RESEARCH
Model
4600
ID: 293764324
Etcher.
LAM RESEARCH 4600 is an advanced etcher/asher for a variety of semiconductor applications. The basic design of 4600 includes two independent ashing chambers, each capable of delivering a wide range of etch depths, temperatures and chemistries. This allows it to accomplish complex etching processes while providing excellent uniformity. LAM RESEARCH 4600 has a dedicated pumping equipment to generate enhanced tool performance and reduce contamination. The flexible pumping system allows for dedicated gas cleaning capability, pressure control, and dynamic gas flow sensing. Multiple chambers are enabled to maintain process stability and reduce the contamination potential of particles. 4600 has several innovative features that are ideal for etching and ashing applications. Its unique "Dry Etching Technology" is preferred for etching shallow trenches and small vias, making it ideal for a variety of application requirements. The unit also employs a three-step "Dry Ashing" process which is designed to achieve high etch rates and low residue by combining dry oxidization and dry etching in one step. This allows for the removal of organic, small feature size, conformal layers and metal dielectrics with great accuracy and ease. LAM RESEARCH 4600 is designed with robust process control tools, including predictive models and feature recognition, to ensure quality yields. This offers great precision and repeatability, ensuring process reproducibility while eliminating the need for manual intervention. In addition to its process control features, 4600 also has a high-speed rotation feature to reduce etch times. This helps to speed up the etching process and minimize defect formation due to uneven ashing. The machine also has several user-friendly interface options, making it a great option for both entry-level and advanced etcher/asher users. LAM RESEARCH 4600 is an advanced etcher/asher designed to provide a wide range of etch depths, temperatures and chemistries to meet the needs of modern semiconductor applications. The tool is designed with robust process control tools, high-speed rotation capabilities, and user-friendly interfaces, making it an excellent choice for both novice and experienced users.
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