Used LAM RESEARCH 4720W #9144773 for sale

LAM RESEARCH 4720W is an etcher / asher equipment specifically designed for the removal of photoresist, metal film, and other surface layers on substrates such as wafers, masks, foils, and glass. It utilizes a combination of mechanical and chemical technologies to provide high-performance etching/ ashing applications. 4720W is capable of processing multiple substrates simultaneously, with an etch rate of up to 2 um/min and a throughput of up to 200 4-inch wafers per hour. Its easy maintenance and comprehensive safety features make it ideal for a variety of laboratory and production applications. LAM RESEARCH 4720W is composed of several key components. Its plasma source features two diode-type plasma sources, one chemical oxide asher (COA) and one plasma etcher (PE). The PE source provides a controlled and uniform plasma for etching while the asher source provides short-duration chemical reaction processes for photoresist removal, etching of metal films, or other ashing applications. Additionally, 4720W is equipped with an electrostatic chuck, gas-controlled showerhead, wafer chuck clamp, and exhaust covers. LAM RESEARCH 4720W's plasma control system offers a range of different processes and parameters, allowing for high-precision etching and ashing applications. Its Advanced Process Controller software features a graphical user interface for optimized recipe development and process control. Additionally, 4720W is equipped with a three-zone gas and pressure control unit for precise chamber atmosphere control. LAM RESEARCH 4720W is designed for easy and safe operation. Its user-friendly LCD controller offers easy operation and its comprehensive safety features, including CE compliance, make it ideal for laboratory and production environments. In addition, its compact design and reduced footprint make it easy to install and integrate with existing production lines. Overall, 4720W is a powerful etcher / asher machine, ideal for a variety of process applications. Its high etch rate, throughput, and flexible processes make it a reliable choice for both laboratory and production environments. Additionally, its easy maintenance and comprehensive safety features make it an ideal choice for a wide range of applications.