Used LAM RESEARCH 4720W #9149817 for sale

LAM RESEARCH 4720W Asher is a state-of-the-art semiconductor wet etching equipment from LAM RESEARCH. This wet etching system is designed to provide high process uniformity and yield at the beginning of the semiconductor process. With its ability to produce thin films quickly and efficiently, 4720W is a valuable tool for multiple processes. The unit incorporates a three-channel plasma etch head design, allowing etching of up to three dies simultaneously. Its advanced membrane valve technology accurately delivers two reactive gas flows for independent flow control. This lets users precisely define the etch dynamics for maximum uniformity across the substrate surface. The membrane valve machine also reduces the amount of particle contamination in the etching tool. LAM RESEARCH 4720W features a single-wafer loadlock, making it easy to transfer online wafers from the input stage into the high-vacuum process chamber. During the process, the magnetic levitation rotary chuck maintains the substrate temperature uniformity. The chuck rotational torque is controlled over a long period of time, which further supports the quality of the etched structures. The asset also has a low-temperature bake capability, allowing users to perform high-temperature treatments without burning the underlying substrates. 4720W includes an advanced particles management model that uses triple filtration. This advanced filtration equipment ensures that only clean particles are delivered to the etched structures during processing. It also minimizes contamination in the process chamber. In addition, LAM RESEARCH 4720W features real-time endpoint detection, which can be used to monitor the etch profile, as well as monitor the progress and uniformity of the etching process. This real-time monitoring capability allows users to quickly detect any process shifts and make adjustments quickly. 4720W Asher is a reliable, cost-effective tool for semiconductor etching. Its advanced technology and triple filtration system enables users to etch highly uniform structures in a short amount of time. Therefore, semiconductor device manufacturers can benefit greatly from employing this unit in their fabrication process.