Used LAM RESEARCH 480LRC #9187407 for sale

Manufacturer
LAM RESEARCH
Model
480LRC
ID: 9187407
Poly etcher Gases: SF6, C2F6, O2, He, and Ni.
LAM RESEARCH 480LRC is an etcher/asher, designed for semiconductors and other materials. It combines etching, ashing, and other processes to create precision components with very high repeatability and accuracy. The LAM 480LRC is a robust, highly robust 8kW source power etcher/asher capable of delivering both high etch rates and superb uniformity across a range of substrate materials. It features an integrated chamber design, electronic control and reporting, precise plasma flow control, and advanced load-lock capability for increased throughput. LAM RESEARCH 480LRC is a fully automated etcher/asher with a single-source power supply and substrate tilted single-plane etching. It operates by using both ion sputtering and ion etching principles to remove material from the substrate's surface. The tilted single-plane etching ensures that all substrate surfaces are uniformly etched, creating high quality, uniform parts with superior reproducibility. With the etcher's etch rate of up to 8 kW, 480LRC can etch quickly and accurately, creating both complex patterns and etching at very high precision levels. In addition, the LAM LAM RESEARCH 480LRC offers a host of advanced features which make it ideal for the etching and ashing of thick and thin-film substrates. It can also be used for trench etching, edge trimming, and high aspect ratio etching. 480LRC's patented gas flow control system makes it ideal for producing both smooth surface topologies and high aspect ratio structures. It is also capable of operating in both conformal and selective etch modes, and is suitable for a wide variety of substrate materials. LAM RESEARCH 480LRC etches robustly and reliably under a variety of conditions and a variety of substrates. It can handle long-term etch projects and provide repeatable results with high accuracy. Its sophisticated control and monitoring systems make it easy to operate and keep up with its constantly changing parameters. With its ability to etch precise patterns with high precision in a single etched plane, it is ideal for the formation of semiconductor components. With an automatic power management system and an integrated load-lock capability for increased throughput, the LAM 480LRC is a reliable and robust etching solution.
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