Used LAM RESEARCH 490 / 480 #9365712 for sale

LAM RESEARCH 490 / 480 is a high speed inclined angle etcher/asher for etching passivation layers and other sensitive materials, specifically polyimide and polysilicon. It utilizes a binary gas injection system to provide precise control of the chemistry and temperature of the etching or ashing process. 490 / 480 uses plasma to break down the molecular structure of materials at a speed, usually faster than wet chemical etching. LAM RESEARCH 490 / 480 is designed with a tilting wafer cassette which allows for faster and more uniform etching. The cassette allows for easy re-assembling and easy extraction of loaded substrates. The tilted angle of the etcher helps prevent chemical precipitation due to turbulence, which can lead to undercutting and chemical segregation. This design also helps to ensure uniform etching over the entirety of the substrates. This etcher/asher uses a programmable gas control unit that is capable of controlling up to 22 gases in combination, making it possible to apply material-specific etching and deposition recipes. The recipe file allows for exact duplicate applications of the same process. In addition, temperature cycling, remote diagnostics and monitoring, and recipe storage further facilitate optimization and consistent results. 490 / 480 can run in multiple modes including etch, ash, clean and dry, allowing for multi-step processes, such as in-situ passivation to reduce residue on the substrate's exposed surfaces. The system performs high uniformity etching down to 10 nanometers with a throughput of 170 wafers per hour, while eliminating base erosion usually associated with wet etching methods. The components of LAM RESEARCH 490 / 480 etcher/asher include a ProFace TM display/operating panel and an E/F-32PCI board that enables automatic wafer-level control. The system also includes a sub-micron filter, dynamic pump control, a lithographically patterned Robot Loadlock, and a PECVD chamber that is connected to the main etcher/washer chamber. 490 / 480 etcher/asher is designed to meet the stringent requirements of mass production applications and is ideal for passivation, dielectric, and other delicate applications. The advanced features and controlled process parameters provide reliable and repeatable results, improving accuracy and efficiency.