Used LAM RESEARCH 490 #293616826 for sale

LAM RESEARCH 490 is an advanced etcher / asher used in the fabrication of semiconductor devices. The etcher / asher is designed for high aspect ratio etching and consists of a multi-zone process chamber, which is part of a cluster tool architecture. The multi-zone process chamber features quartz walls to facilitate zone uniformity over the entire substrate. The first zone of 490 is the wafer-transfer zone which uses a robot to transfer the wafers from the load station into the chamber. The wafer is then agitated in a gentle, yet consistent mixture of polymer beads and etchant, to provide uniform etch rate. The second zone of the etcher / asher is the plasma zone where an inductively coupled plasma (ICP) is used to increase the etch rate and uniformity of the process. The ICP features an advanced arc control equipment to ensure precise control over the plasma. The third zone of the chamber houses a chemical vapor deposition (CVD) system, which is used to perform selective silicon dioxide etching. The fourth zone is the cooling and venting zone which cools the walls and substrates after the etching process is complete. The fifth zone of the chamber is the exhaust zone which exhausts the etchant vapor and any other gases produced during the etching process. LAM RESEARCH 490 etcher / asher is capable of producing high aspect ratio openings with uniform etching across the substrate. Its advanced arc detection unit ensures precise control over the plasma, while the CVD machine provides increased etch selectivity and improved process uniformity. Additionally, the cooling and venting zone helps reduce substrate distortion and helps maintain a consistent etch rate across multiple substrates.