Used LAM RESEARCH 490 #293747959 for sale

LAM RESEARCH 490 is a thermal etching equipment designed to provide the highest quality etch pattern and the best etch process control in the industry. 490 uses reactive ion etch (RIE) technology that combines a substrates surface with a collimated, tightly-controlled plasma of reactive gas to remove targeted material from the coating. LAM RESEARCH 490 integrates numerous key technologies as well as a number of user-friendly software features to deliver a highly reliable system with pinpoint accuracy, repeatable performance and unbeatable speed. 490 features LAM's patented PitchScanTM auto-cleaning function, which eliminates the need for manual particle cleaning. PitchScan can detect and remove particles as small as 4µm, greatly reducing contamination on the substrate surface. This unit also uses the latest technology called Image Enhancement to increase the sharpness, resolution and feature definition of etched patterns. Furthermore, LAM RESEARCH 490's advanced, full-featured optics package has the ability to vary pulse, energy, and beam width. 490 accepts substrates of up to 8" in diameter, while maintaining the same distance-to-sample focus accuracy. LAM RESEARCH 490 offers excellent tool-to-tool uniformity and repeatability in etch patterns, thanks to its advanced temperature control machine. To ensure high throughput, 490 comes with multiple recipe-setups that are able to perform various etch processes. LAM RESEARCH 490 also comes equipped with a twister and shutter tool to minimize cell-to-cell variations. In order to further improve control over the etch process, 490 features an advanced gas self-tuning function. This self-tuning function is able to automatically detect the optimal settings for each recipe to ensure the highest quality etch pattern. Moreover, LAM RESEARCH 490's intuitive user interface provides users with real-time feedback of the results of the etch process. Overall, 490 combines a number of key technologies and software features to deliver a sophisticated tool that meets the highest standards in etch performance and process control.